Efficient and ballistic cold electron emission from porous polycrystalline silicon diodes with a porosity multilayer structure

Author(s):  
Xia Sheng ◽  
Akira Kojima ◽  
Takuya Komoda ◽  
Nobuyoshi Koshida
2002 ◽  
Vol 2 (3) ◽  
pp. 233-235 ◽  
Author(s):  
Hoon Kim ◽  
Jong-Won Park ◽  
Joo-Won Lee ◽  
Yun-Hi Lee ◽  
Yoon-Ho Song ◽  
...  

2000 ◽  
Vol 638 ◽  
Author(s):  
Takuya Komoda ◽  
Tsutomu Ichihara ◽  
Yoshiaki Honda ◽  
Koichi Aizawa ◽  
Nobuyoshi Koshida

AbstractIt is demonstrated that a porous polycrystalline silicon (PPS) film is useful as a ballistic electron emitter for excitation source of a flat panel display. A 1.5 µ m polysilicon layer is deposited on a silicon substrate by Low Pressure Chemical Vapour Deposition (LPCVD) technique and subsequently anodised in an ethanoic HF solution and oxidised in a Rapid Thermal Oxidation (RTO) furnace. A thin Au film is deposited onto the RTO-treated PPS layer and used as a top electrode. The electron emission current Ie and the diode current Ips are measured as a function of the bias voltage Vps. Electron emission of which onset voltage is about 8 V rapidly increases with increasing Vps. The Ie value reaches about 2 mA/cm2 for Vps= 20 V at which the emission efficiency defined as Ie/Ips is about 1 %. The emission mechanism has also been investigated in terms of the correlation between the emitted electron energy and the structure of PPS layer. The observed energy distribution curve of output electrons suggests that the PPS layer acts as a ballistic transport medium and the emission occurs based on multiple tunnelling through silicon nanocrystallites. The PPS layer is also formed on the polysilicon layer deposited on a glass substrate by Plasma Enhanced Chemical Vapour Deposition (PCVD) technique. In this case, the film is treated by an electrochemical oxidation (ECO) in an H2SO4 solution. Similar emission characteristics are observed, although the emission current is lower than that formed on silicon substrate. We also demonstrate the 2.6 inches diagonal 53×40 pixels multicolour flat panel display. We name it ballistic electron surface-emitting display device (BSD). BSD shows the possible application to the future flat panel display.


2021 ◽  
Vol 1851 (1) ◽  
pp. 012022
Author(s):  
I S Bizyaev ◽  
V S Osipov ◽  
V Ye Babyuk ◽  
A I Struchkov ◽  
N M Gnuchev

2020 ◽  
Vol 10 (21) ◽  
pp. 7667
Author(s):  
Leonid Revin ◽  
Andrey Pankratov ◽  
Anna Gordeeva ◽  
Dmitry Masterov ◽  
Alexey Parafin ◽  
...  

The response of the Cold-Electron Bolometers (CEBs), integrated into a 2-D array of dipole antennas, has been measured by irradiation from YBa2Cu3O7−δ (YBCO) 50 μm long Josephson junction into the THz region at frequencies from 0.1 to 0.8 THz. The possibility of controlling the amplitude-frequency characteristic is demonstrated by the external magnetic field in the traveling wave regime of a long Josephson junction. The YBCO junction has been formed on the bicrystal Zr1−xYxO2 (YSZ) substrate by magnetron sputtering and etching of the film. CEBs have been fabricated using an Al multilayer structure by a self-aligned shadow evaporation technique on Si substrate. Both receiver and oscillator have been located inside the same cryostat at 0.3 K and 2.7 K plates, respectively.


1998 ◽  
Vol 509 ◽  
Author(s):  
X. Sheng ◽  
N. Koshida

AbstractBased on the previously-reported porosity multilayer technique, cold electron emission properties of porous silicon (PS) electroluminescent diodes with a structure of Au/PS/n-type Si are further improved by introducing a graded-band multilayer structure. It is shown that electrons are quasiballisticly emitted from PS diodes owing to a significantly reduced electron scattering in PS layer. As a result, the emission current shows a fluctuation-free behavior. These observations are very important for both understanding the electron transport in PS and developing high performance electron emitters in application to vacuum microelectronic technology.


2016 ◽  
Vol 208 ◽  
pp. 174-179 ◽  
Author(s):  
Junying Zhang ◽  
Chunqian Zhang ◽  
Shouming Wu ◽  
Jun Zheng ◽  
Yuhua Zuo ◽  
...  

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