scholarly journals Comparison of infrared frequency selective surfaces fabricated by direct-write electron-beam and bilayer nanoimprint lithographies

2000 ◽  
Vol 18 (6) ◽  
pp. 3578 ◽  
Author(s):  
Irina Puscasu ◽  
G. Boreman ◽  
R. C. Tiberio ◽  
D. Spencer ◽  
R. R. Krchnavek
Keyword(s):  
Electron Beam ◽  
Frequency Selective Surfaces ◽  
Direct Write ◽  
Frequency Selective

Rapid prototyping of frequency selective surfaces by laser direct write

2007 ◽  
Author(s):  
Scott A. Mathews ◽  
Mark Mirotznik ◽  
Brandon L. Good ◽  
Alberto Piqué
Keyword(s):  
Rapid Prototyping ◽  
Frequency Selective Surfaces ◽  
Direct Write ◽  
Frequency Selective ◽  
Laser Direct Write

ELECTRON BEAM DIRECT WRITE EFFECTS ON CMOS DEVICES

1988 ◽  
Vol 49 (C4) ◽  
pp. C4-291-C4-294
Author(s):  
K. BARLOW
Keyword(s):  
Electron Beam ◽  
Direct Write

Nonuniformly illuminated frequency-selective surfaces

1988 ◽  
Vol 24 (14) ◽  
pp. 901 ◽  
Author(s):  
A.M.M.A. Allam ◽  
E.A. Parker
Keyword(s):  
Frequency Selective Surfaces ◽  
Frequency Selective

scholarly journals Expanding 3D Nanoprinting Performance by Blurring the Electron Beam

Micromachines ◽  
2021 ◽  
Vol 12 (2) ◽  
pp. 115
Author(s):  
Lukas Seewald ◽  
Robert Winkler ◽  
Gerald Kothleitner ◽  
Harald Plank
Keyword(s):  
Electron Beam ◽  
Direct Write ◽  
Design Flexibility ◽  
Individual Branch ◽  
Inclination Angles ◽  
3D Architecture ◽  
20 Nm ◽  
Surface Morphologies ◽  
Nm Range ◽  
Mechanical Rigidity

Additive, direct-write manufacturing via a focused electron beam has evolved into a reliable 3D nanoprinting technology in recent years. Aside from low demands on substrate materials and surface morphologies, this technology allows the fabrication of freestanding, 3D architectures with feature sizes down to the sub-20 nm range. While indispensably needed for some concepts (e.g., 3D nano-plasmonics), the final applications can also be limited due to low mechanical rigidity, and thermal- or electric conductivities. To optimize these properties, without changing the overall 3D architecture, a controlled method for tuning individual branch diameters is desirable. Following this motivation, here, we introduce on-purpose beam blurring for controlled upward scaling and study the behavior at different inclination angles. The study reveals a massive boost in growth efficiencies up to a factor of five and the strong delay of unwanted proximal growth. In doing so, this work expands the design flexibility of this technology.

Sign in / Sign up

Export Citation Format

Share Document