Mass spectrometry study during the vapor deposition of poly-para-xylylene thin films

2000 ◽  
Vol 18 (5) ◽  
pp. 2459 ◽  
Author(s):  
J. B. Fortin ◽  
T.-M. Lu
Keyword(s):  
Mass Spectrometry ◽  
Thin Films ◽  
Vapor Deposition ◽  
Mass Spectrometry Study

Structure and Diffusion of Asymmetric Diblock Copolymers in Thin Films:  A Dynamic Secondary Ion Mass Spectrometry Study

1998 ◽  
Vol 31 (25) ◽  
pp. 8826-8830 ◽  
Author(s):  
Hideaki Yokoyama ◽  
Edward J. Kramer ◽  
Miriam H. Rafailovich ◽  
Jonathan Sokolov ◽  
Steven A. Schwarz
Keyword(s):  
Mass Spectrometry ◽  
Thin Films ◽  
Diblock Copolymers ◽  
Secondary Ion Mass Spectrometry ◽  
Mass Spectrometry Study ◽  
Ion Mass Spectrometry ◽  
And Diffusion ◽  
Secondary Ion

{10} edge dislocations in YSZ films grown on (100)MgO by PLD

1994 ◽  
Vol 52 ◽  
pp. 530-531
Author(s):  
Jason R. Heffelfinger ◽  
C. Barry Carter
Keyword(s):  
Thin Films ◽  
Semiconductor Lasers ◽  
Vapor Deposition ◽  
Substrate Surface ◽  
Laser System ◽  
Average Energy ◽  
Target Material ◽  
Chemical Vapor ◽  
Buffer Layers ◽  
Organic Chemical

Yttria-stabilized zirconia (YSZ) is currently used in a variety of applications including oxygen sensors, fuel cells, coatings for semiconductor lasers, and buffer layers for high-temperature superconducting films. Thin films of YSZ have been grown by metal-organic chemical vapor deposition, electrochemical vapor deposition, pulse-laser deposition (PLD), electron-beam evaporation, and sputtering. In this investigation, PLD was used to grow thin films of YSZ on (100) MgO substrates. This system proves to be an interesting example of relationships between interfaces and extrinsic dislocations in thin films of YSZ.In this experiment, a freshly cleaved (100) MgO substrate surface was prepared for deposition by cleaving a lmm-thick slice from a single-crystal MgO cube. The YSZ target material which contained 10mol% yttria was prepared from powders and sintered to 85% of theoretical density. The laser system used for the depositions was a Lambda Physik 210i excimer laser operating with KrF (λ=248nm, 1Hz repetition rate, average energy per pulse of 100mJ).

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