Reliability Challenges in Design and Operation of High Heat Powered Processors

2005 ◽  
Author(s):  
Ali Heydari ◽  
Vadim Gektin
Keyword(s):  
Heat Flux ◽  
Closed Loop ◽  
Heat Removal ◽  
High Heat ◽  
Electrical Signal ◽  
Open Loop ◽  
Heat Fluxes ◽  
High Heat Flux ◽  
Air Cooling ◽  
Interconnect Design

Advances in processor design have been made possible in part by increases in the packaging density of electronics. At the same time, combination of increased power dissipation and packaging density has led to substantial growth in the chip and system heat fluxes and amplified complexity in electrical signal integrity and mechanical stack-up design in the recent years, particularly, in the high-end computers. With the trend towards miniaturization, heat removal, along with increased reliability requirements, has become a major bottleneck in product development, especially, in low profile systems, telecom servers and blades. Cooling of high heat flux components may require consideration of innovative open-loop, as well as plausible closed-loop, cooling designs for data centers. This paper addresses reliability aspects of thermal, electrical, mechanical, and interconnect design and long-life operation of high-end air-cooling, as well as feasible active open and closed-loop cooling technologies of high heat flux processors.

Experimental Characterization of Two-Phase Cooling of Power Electronics in Thermosiphon and Forced Convection Modes

2021 ◽  
Vol 143 (3) ◽  
Author(s):  
Fabio Battaglia ◽  
Farah Singer ◽  
David C. Deisenroth ◽  
Michael M. Ohadi
Keyword(s):  
Heat Flux ◽  
Thermal Resistance ◽  
Power Electronics ◽  
Forced Convection ◽  
Heat Removal ◽  
High Heat ◽  
Heat Fluxes ◽  
High Heat Flux ◽  
Two Phase ◽  
Total Thermal Resistance

Abstract In this paper, we present the results of an experimental study involving low thermal resistance cooling of high heat flux power electronics in a forced convection mode, as well as in a thermosiphon (buoyancy-driven) mode. The force-fed manifold microchannel cooling concept was utilized to substantially improve the cooling performance. In our design, the heat sink was integrated with the simulated heat source, through a single solder layer and substrate, thus reducing the total thermal resistance. The system was characterized and tested experimentally in two different configurations: the passive (buoyancy-driven) loop and the forced convection loop. Parametric studies were conducted to examine the role of different controlling parameters. It was demonstrated that the thermosiphon loop can handle heat fluxes in excess of 200 W/cm2 with a cooling thermal resistance of 0.225 (K cm2)/W for the novel cooling concept and moderate fluctuations in temperature. In the forced convection mode, a more uniform temperature distribution was achieved, while the heat removal performance was also substantially enhanced, with a corresponding heat flux capacity of up to 500 W/cm2 and a thermal resistance of 0.125 (K cm2)/W. A detailed characterization leading to these significant results, a comparison between the performance between the two configurations, and a flow visualization in both configurations are discussed in this paper.

STABLE, CALM, AND HIGH-HEAT-FLUX HEAT REMOVAL USING A POROUS-MICRO-CHANNEL

2017 ◽  
Author(s):  
Tomio Okawa ◽  
Junki Ohashi ◽  
Ryo Hirata ◽  
Koji Enoki
Keyword(s):  
Heat Flux ◽  
Heat Removal ◽  
High Heat ◽  
High Heat Flux ◽  
Micro Channel

Thermo-Fluid-Stress-Deformation Analysis of Two-Layer Microchannels for Cooling Chips With Hot Spots

2015 ◽  
Vol 137 (3) ◽  
Author(s):  
Abas Abdoli ◽  
George S. Dulikravich ◽  
Genesis Vasquez ◽  
Siavash Rastkar
Keyword(s):  
Heat Flux ◽  
Thermal Stresses ◽  
Hot Spot ◽  
Heat Removal ◽  
High Heat ◽  
Heat Transfer Analysis ◽  
Deformation Analysis ◽  
High Heat Flux ◽  
Cooling Design ◽  
Microchannel Cooling

Two-layer single phase flow microchannels were studied for cooling of electronic chips with a hot spot. A chip with 2.45 × 2.45 mm footprint and a hot spot of 0.5 × 0.5 mm in its center was studied in this research. Two different cases were simulated in which heat fluxes of 1500 W cm−2 and 2000 W cm−2 were applied at the hot spot. Heat flux of 1000 W cm−2 was applied on the rest of the chip. Each microchannel layer had 20 channels with an aspect ratio of 4:1. Direction of the second microchannel layer was rotated 90 deg with respect to the first layer. Fully three-dimensional (3D) conjugate heat transfer analysis was performed to study the heat removal capacity of the proposed two-layer microchannel cooling design for high heat flux chips. In the next step, a linear stress analysis was performed to investigate the effects of thermal stresses applied to the microchannel cooling design due to variations of temperature field. Results showed that two-layer microchannel configuration was capable of removing heat from high heat flux chips with a hot spot.

Heat Transfer Enhancement in Compact Phase Change Microchannel Heat Exchangers for High Flux Laser Diodes

2018 ◽  
Author(s):  
Jensen Hoke ◽  
Todd Bandhauer ◽  
Jack Kotovsky ◽  
Julie Hamilton ◽  
Paul Fontejon
Keyword(s):  
Heat Transfer ◽  
Heat Flux ◽  
Phase Change ◽  
Flow Boiling ◽  
Laser Diodes ◽  
High Heat ◽  
Heat Fluxes ◽  
High Heat Flux ◽  
Maximum Heat ◽  
Average Maximum

Liquid-vapor phase change heat transfer in microchannels offers a number of significant advantages for thermal management of high heat flux laser diodes, including reduced flow rates and near constant temperature heat rejection. Modern laser diode bars can produce waste heat loads >1 kW cm−2, and prior studies show that microchannel flow boiling heat transfer at these heat fluxes is possible in very compact heat exchanger geometries. This paper describes further performance improvements through area enhancement of microchannels using a pyramid etching scheme that increases heat transfer area by ∼40% over straight walled channels, which works to promote heat spreading and suppress dry-out phenomenon when exposed to high heat fluxes. The device is constructed from a reactive ion etched silicon wafer bonded to borosilicate to allow flow visualization. The silicon layer is etched to contain an inlet and outlet manifold and a plurality of 40μm wide, 200μm deep, 2mm long channels separated by 40μm wide fins. 15μm wide 150μm long restrictions are placed at the inlet of each channel to promote uniform flow rate in each channel as well as flow stability in each channel. In the area enhanced parts either a 3μm or 6μm sawtooth pattern was etched vertically into the walls, which were also scalloped along the flow path with the a 3μm periodicity. The experimental results showed that the 6μm area-enhanced device increased the average maximum heat flux at the heater to 1.26 kW cm2 using R134a, which compares favorably to a maximum of 0.95 kw cm2 dissipated by the plain walled test section. The 3μm area enhanced test sections, which dissipated a maximum of 1.02 kW cm2 showed only a modest increase in performance over the plain walled test sections. Both area enhancement schemes delayed the onset of critical heat flux to higher heat inputs.

scholarly journals Influence of the ambient temperature on the cooling efficiency of the high performance cooling device with thermosiphon effect

2018 ◽  
Vol 180 ◽  
pp. 02073
Author(s):  
Patrik Nemec ◽  
Milan Malcho
Keyword(s):  
Ambient Temperature ◽  
High Performance ◽  
Convection Heat Transfer ◽  
Heat Removal ◽  
Measuring Method ◽  
High Heat ◽  
Heat Fluxes ◽  
High Heat Flux ◽  
Cooling Efficiency ◽  
Cooling Device

This work deal with experimental measurement and calculation cooling efficiency of the cooling device working with a heat pipe technology. The referred device in the article is cooling device capable transfer high heat fluxes from electric elements to the surrounding. The work contain description, working principle and construction of cooling device. The main factor affected the dissipation of high heat flux from electronic elements through the cooling device to the surrounding is condenser construction, its capacity and option of heat removal. Experimental part describe the measuring method cooling efficiency of the cooling device depending on ambient temperature in range -20 to 40°C and at heat load of electronic components 750 W. Measured results are compared with results calculation based on physical phenomena of boiling, condensation and natural convection heat transfer.

Dependence of Heat Transfer Coefficient on Porous Structure in Porous Media

2008 ◽  
Author(s):  
Akira Matsui ◽  
Kazuhisa Yuki ◽  
Hidetoshi Hashizume
Keyword(s):  
Heat Transfer ◽  
Heat Flux ◽  
Porous Media ◽  
Heat Transfer Coefficient ◽  
Transfer Coefficient ◽  
High Performance ◽  
Heat Removal ◽  
High Heat ◽  
Metal Foams ◽  
High Heat Flux

Detailed heat transfer characteristics of particle-sintered porous media and metal foams are evaluated to specify the important structural parameters suitable for high heat removal. The porous media used in this experiment are particle-sintered porous media made of bronze and SUS316L, and metal foams made of copper and nickel. Cooling water flows into the porous medium opposite to heat flux input loaded by a plasma arcjet. The result indicates that the bronze-particle porous medium of 100μm in pore size shows the highest performance and achieves heat transfer coefficient of 0.035MW/m2K at inlet heat flux 4.6MW/m2. Compared with the heat transfer performance of copper fiber-sintered porous media, the bronze particlesintered ones give lower heat transfer coefficient. However, the stable cooling conditions that the heat transfer coefficient does not depend on the flow velocity, were confirmed even at heat flux of 4.6MW/m2 in case of the bronze particle-sintered media, while not in the case of the copper-fiber sintered media. This signifies the possibility that the bronze-particle sintered media enable much higher heat flux removal of over 10MW/m2, which could be caused by higher permeability of the particle-sintered pore structures. Porous media with high permeability provide high performance of vapor evacuation, which leads to more stable heat removal even under extremely high heat flux. On the other hand, the heat transfer coefficient of the metal foams becomes lower because of the lower capillary and fin effects caused by too high porosity and low effective thermal conductivity. It is concluded that the pore structure having high performance of vapor evacuation as well as the high capillary and high fin effects is appropriate for extremely high heat flux removal of over 10MW/m2.

Optimization of Refrigeration Systems for High-Heat-Flux Microelectronics

2008 ◽  
Author(s):  
P. E. Phelan ◽  
Y. Gupta ◽  
H. Tyagi ◽  
R. Prasher ◽  
J. Cattano ◽  
...  
Keyword(s):  
Heat Flux ◽  
Energy Consumption ◽  
System Design ◽  
High Heat ◽  
Heat Fluxes ◽  
Operating Conditions ◽  
High Heat Flux ◽  
Vapor Compression ◽  
Refrigeration System ◽  
Compressor Inlet

Increasingly, military and civilian applications of electronics require extremely high heat fluxes, on the order of 1000 W/cm2. Thermal management solutions for these severe operating conditions are subject to a number of constraints, including energy consumption, controllability, and the volume or size of the package. Calculations indicate that the only possible approach to meeting this heat flux condition, while maintaining the chip temperature below 50 °C, is to utilize refrigeration. Here we report an initial optimization of the refrigeration system design. Because the outlet quality of the fluid leaving the evaporator must be held to approximately less than 20%, in order to avoid reaching critical heat flux, the refrigeration system design is dramatically different from typical configurations for household applications. In short, a simple vapor-compression cycle will require excessive energy consumption, largely because of the superheat required to return the refrigerant to its vapor state before the compressor inlet. A better design is determined to be a “two-loop” cycle, in which the vapor-compression loop is coupled thermally to a primary loop that directly cools the high-heat-flux chip.

10310 A study on high heat flux heat removal with phase change using a porous metal

2014 ◽  
Vol 2014.20 (0) ◽  
pp. _10310-1_-_10310-2_
Author(s):  
Daiki Hanzawa ◽  
Kyosuke Katsumata ◽  
Tomio Okawa
Keyword(s):  
Heat Flux ◽  
Phase Change ◽  
Heat Removal ◽  
Porous Metal ◽  
High Heat ◽  
High Heat Flux

A Study on High Heat Flux Heat Removal With Boiling Using Porous Microchannel

2014 ◽  
Author(s):  
Daiki Hanzawa ◽  
Kyosuke Katsumata ◽  
Tomio Okawa
Keyword(s):  
Heat Flux ◽  
Pore Size ◽  
Mass Flux ◽  
Pressure Loss ◽  
Heat Removal ◽  
Porous Metal ◽  
High Heat ◽  
High Mass ◽  
High Heat Flux ◽  
Small Flow

This paper reports the critical heat flux (CHF) enhancement that was observed experimentally when a porous metal was placed in a small flow channel (hereafter, this channel is called a “porous microchannel”). In the porous microchannel, the CHF value increased almost linearly with increased values of the mass flux and the inlet subcooling. In consequence, higher cooling performance was achieved under high mass flux and high inlet subcooling conditions. It was also found that considerable fluctuation of the pressure loss frequently encountered in a small heated channel disappears in the porous microchannel. It was considered that the stabilization of the pressure loss can mainly be attributed to inhibition of the formation of large bubbles. The effects of the material and the pore size of the porous metal were also investigated. Silver and nickel were selected as the porous metal material and the pore size tested was 0.2 and 0.6 mm. In the present experiments, the CHF value was not influenced significantly by the material in spite of the distinct difference of the thermal conductivity between silver and nickel, whilst it was dependent noticeably on the pore size. It was hence suggested that the CHF enhancement observed in this work was mainly caused by the complex thermal-hydraulic field formed in the porous microchannel. Preliminary results of the flow visualization performed to reveal the mechanisms of the CHF enhancement in the porous microchannel was also reported.

Integrated Vapor Chamber Heat Spreader for Power Module Applications

2017 ◽  
Author(s):  
Clayton L. Hose ◽  
Dimeji Ibitayo ◽  
Lauren M. Boteler ◽  
Jens Weyant ◽  
Bradley Richard
Keyword(s):  
Heat Flux ◽  
Thermal Resistance ◽  
Power Electronics ◽  
Coefficient Of Thermal Expansion ◽  
High Heat ◽  
Heat Fluxes ◽  
High Heat Flux ◽  
Vapor Chamber ◽  
Power Module ◽  
Heat Spreader

This work presents a demonstration of a coefficient of thermal expansion (CTE) matched, high heat flux vapor chamber directly integrated onto the backside of a direct bond copper (DBC) substrate to improve heat spreading and reduce thermal resistance of power electronics modules. Typical vapor chambers are designed to operate at heat fluxes > 25 W/cm2 with overall thermal resistances < 0.20 °C/W. Due to the rising demands for increased thermal performance in high power electronics modules, this vapor chamber has been designed as a passive, drop-in replacement for a standard heat spreader. In order to operate with device heat fluxes >500 W/cm2 while maintaining low thermal resistance, a planar vapor chamber is positioned onto the backside of the power substrate, which incorporates a specially designed wick directly beneath the active heat dissipating components to balance liquid return and vapor mass flow. In addition to the high heat flux capability, the vapor chamber is designed to be CTE matched to reduce thermally induced stresses. Modeling results showed effective thermal conductivities of up to 950 W/m-K, which is 5 times better than standard copper-molybdenum (CuMo) heat spreaders. Experimental results show a 43°C reduction in device temperature compared to a standard solid CuMo heat spreader at a heat flux of 520 W/cm2.

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