Laser-Induced Chemical Vapor Deposition on Moving Glass Rods

2003 ◽  
Author(s):  
King Hong Kwok ◽  
Wilson K. S. Chiu
Keyword(s):  
Chemical Vapor Deposition ◽  
Deposition Rate ◽  
Vapor Deposition ◽  
Hot Spot ◽  
Substrate Surface ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Film Deposition ◽  
Carbon Coatings ◽  
Glass Rods

The feasibility of using pyrolytic Laser-Induced Chemical Vapor Deposition (LCVD) to deposit carbon coatings on moving fused quartz rods have been investigated in this study. This LCVD system uses a CO2 laser to locally heat substrates in open air to create a hot spot. Pyrolysis of hydrocarbon species occurs and subsequently deposits a layer of carbon film onto the substrate surface. The results of this study indicate that the deposition rate of carbon film increases exponentially within the range of laser power, while an increase in traverse velocity of the substrate will also increase the deposition rate until a maximum deposition rate is reached, and further increases in the traverse velocity will decrease the deposition rate. We suspect that this optimal deposition rate is caused by substrate motion, which affects the substrate surface temperature, and consequently the effective surface area available for film deposition.

Synthesis of Carbon Nanotubes on a Moving Substrate by Laser-Induced Chemical Vapor Deposition

2005 ◽  
Author(s):  
Kinghong Kwok ◽  
Wilson K. S. Chiu
Keyword(s):  
Carbon Nanotubes ◽  
Chemical Vapor Deposition ◽  
Deposition Rate ◽  
Vapor Deposition ◽  
Substrate Surface ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Multi Wall Carbon Nanotubes ◽  
Vapor Deposition Technique ◽  
Synthesis Of Carbon Nanotubes

An open-air laser-induced chemical vapor deposition technique has been successfully used to rapidly deposit pillars of carbon nanotube forest on a moving glass substrate. A CO2 laser is used to heat a traversing fused quartz rod covered with metal particles inside a hydrocarbon environment. Pyrolysis of hydrocarbon precursor gas occurs and subsequently gives rise to the growth of multi-wall carbon nanotubes on the substrate surface. The experimental results indicate that nanotube growth kinetics and microstructure are strongly dependent on the experimental parameters such as laser power. The typical deposition rate of carbon nanotubes achieved in this study is over 50 μm/s, which is relatively high compared to existing synthesis techniques. At high power laser irradiation, carbon fibers and carbon film are formed as a result of excessive formation of amorphous carbon on the substrate. High-resolution transmission and scanning electron microscopy, and x-ray energy-dispersive spectrometry are used to investigate the deposition rate, microstructure and chemical composition of the catalytic surface and the deposited carbon nanotubes.

Effects of Acetylene on Deposition Rate of Stainless Steels Using Thermal Chemical Vapor Deposition

2016 ◽  
Vol 23 ◽  
pp. 7-12 ◽  
Author(s):  
M. Mostafizur Rahman ◽  
Shaon Talukdar ◽  
Mohammad Asaduzzaman Chowdhury ◽  
Rasel Khan ◽  
Abdullah A. Masum ◽  
...  
Keyword(s):  
Stainless Steel ◽  
Chemical Vapor Deposition ◽  
Deposition Rate ◽  
Flow Rate ◽  
Vapor Deposition ◽  
Gas Flow ◽  
Chemical Vapor ◽  
Film Deposition ◽  
Gas Flow Rate ◽  
Thermal Chemical Vapor Deposition

A hot filament thermal chemical vapor deposition (CVD) reactor was used to deposit solid thin films on stainless steel 316 (SS 316) and stainless steel 201 (SS 201) substrates at different flow rates of acetylene (C2H2) gas. The variation of thin film deposition rate with the variation of gas flow rate has been investigated experimentally. During experiments are conducted under gas flow rate (1-5) lit/min gas flow rate, duration of deposition (10-60 min), pressure (0.2-1 bar), average surface roughness (0.3-1.05) µm and temperature 800 °C considered. Experimental results show that deposition rate on SS 316 and SS 201 increases with the increase in gas flow rate. The deposition rate also shows increasing trend with pressure and duration of deposition. Under the above mentioned experimental conditions deposition is found to be maximum of SS-316 compared to SS-201. In relation to roughness the maximum deposition is found at 0.5 microns but comparing the both materials -316 and-201 highest of deposition rate is obtained from SS-316.

Microstructure of Carbon Film Deposited Using Hot-Filament Chemical Vapor Deposition

2015 ◽  
Vol 48 (6) ◽  
pp. 104-109
Author(s):  
Youn-Joon Baik ◽  
Do-Hyun Kwon ◽  
Jong-Keuk Park ◽  
Wook-Seong Lee
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Carbon Film ◽  
Chemical Vapor ◽  
Hot Filament

Anisotropic Plasma ChemicalVapor Deposition of Copper Films in Trenches

2003 ◽  
Vol 766 ◽  
Author(s):  
Kosuke Takenaka ◽  
Masao Onishi ◽  
Manabu Takenshita ◽  
Toshio Kinoshita ◽  
Kazunori Koga ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Deposition Rate ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Anisotropic Plasma ◽  
Bottom Surface ◽  
Chemical Vapor Deposition Method ◽  
Copper Films ◽  
Deposition Method ◽  
Via Holes

AbstractAn ion-assisted chemical vapor deposition method by which Cu is deposited preferentially from the bottom of trenches (anisotropic CVD) has been proposed in order to fill small via holes and trenches. By using Ar + H2 + C2H5OH[Cu(hfac)2] discharges with a ratio H2 / (H2 + Ar) = 83%, Cu is filled preferentially from the bottom of trenches without deposition on the sidewall and top surfaces. The deposition rate on the bottom surface of trenches is experimentally found to increase with decreasing its width.

Microwave plasma-assisted chemical vapor deposition of porous carbon film as supercapacitive electrodes

2017 ◽  
Vol 409 ◽  
pp. 261-269 ◽  
Author(s):  
Ai-Min Wu ◽  
Chen-Chen Feng ◽  
Hao Huang ◽  
Ramon Alberto Paredes Camacho ◽  
Song Gao ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Porous Carbon ◽  
Microwave Plasma ◽  
Carbon Film ◽  
Chemical Vapor
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