Enhancing the Cycling Stability of Tin Sulfide Anodes for Lithium Ion Battery by Titanium Oxide Atomic Layer Deposition

2016 ◽  
Vol 13 (2) ◽  
Author(s):  
Dongsheng Guan ◽  
Chris Yuan
Keyword(s):  
Atomic Layer Deposition ◽  
Structural Integrity ◽  
Electrochemical Impedance ◽  
Protective Coatings ◽  
Lithium Ion ◽  
Atomic Layer ◽  
Cycling Stability ◽  
Tin Sulfide ◽  
Transfer Resistance ◽  
Layer Deposition

The poor cyclability problem of SnS2 anodes in Li-ion batteries (LIB) is tackled for the first time by surface coatings with TiO2 via atomic layer deposition (ALD). ALD is capable to achieve uniform, conformal nanoscale coatings onto entire SnS2 electrodes, and enhance their cycling stability and rate performance. From our study, we found that the bare electrode delivers capacities eventually down to 219.2 mA h g−1 over 50 cycles, while the ALD TiO2-coated gains a final capacity of 323.7 mA h g−1 (47.7% higher). Electrochemical impedance analyses reveal that the improvement is ascribed to the smaller charge transfer resistance and formation of thinner solid–electrolyte interfaces (SEI) in the coated electrode, thanks to its better structural integrity and less electrolyte decomposition in the presence of protective coatings.

scholarly journals Plasma Enhanced Atomic Layer Deposition of Tantalum (V) Oxide

Coatings ◽  
2021 ◽  
Vol 11 (10) ◽  
pp. 1206
Author(s):  
Pavel Fedorov ◽  
Denis Nazarov ◽  
Oleg Medvedev ◽  
Yury Koshtyal ◽  
Aleksander Rumyantsev ◽  
...  
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Photoelectron Spectroscopy ◽  
Protective Coatings ◽  
Lithium Ion ◽  
Atomic Layer ◽  
Evaporator Temperature ◽  
Current Increase ◽  
X Ray ◽  
Layer Deposition

The tantalum oxide thin films are promising materials for various applications: as coatings in optical devices, as dielectric layers for micro and nanoelectronics, and for thin-films solid-state lithium-ion batteries (SSLIBs). This article is dedicated to the Ta-O thin-film system synthesis by the atomic layer deposition (ALD) which allows to deposit high quality films and coatings with excellent uniformity and conformality. Tantalum (V) ethoxide (Ta(OEt)5) and remote oxygen plasma were used as tantalum-containing reagent and oxidizing co-reagent, respectively. The influence of deposition parameters (reactor and evaporator temperature, pulse and purge times) on the growth rate were studied. The thickness of the films were measured by spectroscopic ellipsometry, scanning electron microscopy and X-ray reflectometry. The temperature range of the ALD window was 250–300 °C, the growth per cycle was about 0.05 nm/cycle. Different morphology of films deposited on silicon and stainless steel was found. According to the X-ray diffraction data, the as-prepared films were amorphous. But the heat treatment study shows crystallization at 800 °C with the formation of the polycrystalline Ta2O5 phase with a rhombic structural type (Pmm2). The results of the X-ray reflectometry show the Ta-O films’ density is 7.98 g/cm3, which is close to the density of crystalline Ta2O5 of the rhombic structure (8.18 g/cm3). The obtained thin films have a low roughness and high uniformity. The chemical composition of the surface and bulk of Ta-O coatings was studied by X-ray photoelectron spectroscopy and energy-dispersive X-ray spectroscopy. Surface of the films contain Ta2O5 and some carbon contamination, but the bulk of the films does not contain carbon and any precursor residues. Cyclic voltammetry (CVA) showed that there is no current increase for tantalum (V) oxide in a potential window of 3–4.2 V and has prospects of use as protective coatings for cathode materials of SSLIBs.

scholarly journals Atomic Layer Deposition of Ni-Co-O Thin-Film Electrodes for Solid-State LIBs and the Influence of Chemical Composition on Overcapacity

Nanomaterials ◽  
2021 ◽  
Vol 11 (4) ◽  
pp. 907
Author(s):  
Yury Koshtyal ◽  
Ilya Mitrofanov ◽  
Denis Nazarov ◽  
Oleg Medvedev ◽  
Artem Kim ◽  
...  
Keyword(s):  
Chemical Composition ◽  
Atomic Layer Deposition ◽  
Nickel Oxide ◽  
Cobalt Oxide ◽  
Lithium Ion ◽  
Atomic Layer ◽  
Metallic Nickel ◽  
Uniform Density ◽  
Oxide Content ◽  
Layer Deposition

Nanostructured metal oxides (MOs) demonstrate good electrochemical properties and are regarded as promising anode materials for high-performance lithium-ion batteries (LIBs). The capacity of nickel-cobalt oxides-based materials is among the highest for binary transition metals oxide (TMOs). In the present paper, we report the investigation of Ni-Co-O (NCO) thin films obtained by atomic layer deposition (ALD) using nickel and cobalt metallocenes in a combination with oxygen plasma. The formation of NCO films with different ratios of Ni and Co was provided by ALD cycles leading to the formation of nickel oxide (a) and cobalt oxide (b) in one supercycle (linear combination of a and b cycles). The film thickness was set by the number of supercycles. The synthesized films had a uniform chemical composition over the depth with an admixture of metallic nickel and carbon up to 4 at.%. All samples were characterized by a single NixCo1-xO phase with a cubic face-centered lattice and a uniform density. The surface of the NCO films was uniform, with rare inclusions of nanoparticles 15–30 nm in diameter. The growth rates of all films on steel were higher than those on silicon substrates, and this difference increased with increasing cobalt concentration in the films. In this paper, we propose a method for processing cyclic voltammetry curves for revealing the influence of individual components (nickel oxide, cobalt oxide and solid electrolyte interface—SEI) on the electrochemical capacity. The initial capacity of NCO films was augmented with an increase of nickel oxide content.

Atomic Layer Deposition of Hierarchical CNTs@FePO4Architecture as a 3D Electrode for Lithium-Ion and Sodium-Ion Batteries

2016 ◽  
Vol 3 (21) ◽  
pp. 1600468 ◽  
Author(s):  
Jian Liu ◽  
Biqiong Wang ◽  
Qian Sun ◽  
Ruying Li ◽  
Tsun-Kong Sham ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Lithium Ion ◽  
Atomic Layer ◽  
Sodium Ion ◽  
Sodium Ion Batteries ◽  
Layer Deposition ◽  
3D Electrode
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