scholarly journals Discussion: “Effect of Exposure Time on Cavitation Damage” (Plesset, M. S., and Devine, R. E., 1966, ASME J. Basic Eng., 88, pp. 691–699)

1966 ◽  
Vol 88 (4) ◽  
pp. 699-700
Author(s):  
Phillip Eisenberg
Keyword(s):  
Exposure Time ◽  
Cavitation Damage

Progress In The Practical Application Of Automated Image Analysis To Tem Negatives

1977 ◽  
Vol 35 ◽  
pp. 214-217
Author(s):  
F. A. Heckman ◽  
E. Redman ◽  
J.E. Connolly
Keyword(s):  
Image Analysis ◽  
Image Quality ◽  
Exposure Time ◽  
Image Contrast ◽  
Automated Image Analysis ◽  
Practical Application ◽  
Factors Affecting ◽  
High Image Quality ◽  
Qualitative Evidence ◽  
Comprehensive Study

In our initial publication on this subject1) we reported results demonstrating that contrast is the most important factor in producing the high image quality required for reliable image analysis. We also listed the factors which enhance contrast in order of the experimentally determined magnitude of their effect. The two most powerful factors affecting image contrast attainable with sheet film are beam intensity and KV. At that time we had only qualitative evidence for the ranking of enhancing factors. Later we carried out the densitometric measurements which led to the results outlined below.Meaningful evaluations of the cause-effect relationships among the considerable number of variables in preparing EM negatives depend on doing things in a systematic way, varying only one parameter at a time. Unless otherwise noted, we adhered to the following procedure evolved during our comprehensive study:Philips EM-300; 30μ objective aperature; magnification 7000- 12000X, exposure time 1 second, anti-contamination device operating.

Structure images of Si, Ge and Mos2 crystals and some application to radiation damage studies

1978 ◽  
Vol 36 (1) ◽  
pp. 292-293 ◽  
Author(s):  
K. Izui ◽  
T. Nishida ◽  
S. Furuno ◽  
H. Otsu ◽  
S. Kuwabara
Keyword(s):  
Radiation Damage ◽  
Exposure Time ◽  
Gaussian Distribution ◽  
Intensity Distribution ◽  
Chromatic Aberration ◽  
Magnetic Lens

Recently we have observed the structure images of silicon in the (110), (111) and (100) projection respectively, and then examined the optimum defocus and thickness ranges for the formation of such images on the basis of calculations of image contrasts using the n-slice theory. The present paper reports the effects of a chromatic aberration and a slight misorientation on the images, and also presents some applications of structure images of Si, Ge and MoS2 to the radiation damage studies.(1) Effect of a chromatic aberration and slight misorientation: There is an inevitable fluctuation in the amount of defocus due to a chromatic aberration originating from the fluctuations both in the energies of electrons and in the magnetic lens current. The actual image is a results of superposition of those fluctuated images during the exposure time. Assuming the Gaussian distribution for defocus, Δf around the optimum defocus value Δf0, the intensity distribution, I(x,y) in the image formed by this fluctuation is given by

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