The Heat Transfer Problem for the Modified Chemical Vapor Deposition Process

1987 ◽  
Vol 109 (3) ◽  
pp. 642-646 ◽  
Author(s):  
M. Choi ◽  
H. R. Baum ◽  
R. Greif
Keyword(s):  
Heat Transfer ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Transfer Problem ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Heat Transfer Problem ◽  
Chemical Vapor Deposition Process ◽  
Variable Properties ◽  
Vapor Deposition Process

The heat transfer problem related to the modified chemical vapor deposition process has been analyzed in the high Peclet number limit. Variations in the axial, angular, and radial directions are presented. Of particular interest are the effects of tube rotation and variable properties on the temperature profiles.

A Study of Heat Transfer and Particle Motion Relative to the Modified Chemical Vapor Deposition Process

1989 ◽  
Vol 111 (4) ◽  
pp. 1031-1037 ◽  
Author(s):  
M. Choi ◽  
R. Greif ◽  
H. R. Baum
Keyword(s):  
Heat Transfer ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Particle Motion ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Forced Flow ◽  
Chemical Vapor Deposition Process ◽  
Particle Trajectories ◽  
Vapor Deposition Process

Heat transfer and particle motion relative to the modified chemical vapor deposition process have been studied for general values of the torch speed. Three-dimensional temperature fields have been obtained over the entire cross section of the tube and the effects of tube rotation and localized torch heating in the axial and circumferential directions have been studied. The particle trajectories have been calculated from a formulation that includes the contributions from forced flow, i.e, Poiseuille flow in the axial direction, rigid body rotation about the tube axis, and thermophoretic contributions in the axial, radial, and angular directions. The particle trajectories are helices and are shown to be strongly dependent on the tube rotation.

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