scholarly journals Ultra-Thin Overcoats for the Head/Disk Interface Tribology

1998 ◽  
Vol 120 (4) ◽  
pp. 795-799 ◽  
Author(s):  
C. Singh Bhatia ◽  
S. Anders ◽  
I. G. Brown ◽  
K. Bobb ◽  
R. Hsiao ◽  
...  
Keyword(s):  
High Hardness ◽  
Disk Surface ◽  
Carbon Films ◽  
Head Disk Interface ◽  
Disk Interface ◽  
Cathodic Arc Deposition ◽  
Carbon Overcoats ◽  
Contact Recording ◽  
Cathodic Arc ◽  
Arc Deposition

Cathodic arc deposition forms ultra-thin amorphous hard carbon films of high sp3 content, high hardness, and low coefficient of friction. These properties make it of great interest for head/disk interface application, in particular for contact recording. In many cases, the tribological properties of the head disk interface could be improved by factors up to ten by applying cathodic arc overcoats to the slider or disk surface. This paper reviews the results of cathodic arc ultra-thin (2–10 nm) carbon overcoats for head/disk interface tribological applications.

Structure of high hardness cathodic-arc deposited carbon

1995 ◽  
Vol 53 ◽  
pp. 206-207
Author(s):  
D. L. Callahan ◽  
S. D. McAdams ◽  
S. Anders ◽  
A. Anders ◽  
I.G. Brown ◽  
...  
Keyword(s):  
High Hardness ◽  
Carbon Films ◽  
Peak Hardness ◽  
Nanocrystalline Phase ◽  
Substrate Bias ◽  
Plan View ◽  
Cathodic Arc Deposition ◽  
Transmission Electron ◽  
Cathodic Arc ◽  
Arc Deposition

Carbon films exhibiting a peak hardness of 59 GPa have been produced using pulsebiased cathodic-arc deposition. This value is much greater than that expected of an amorphous "diamond-like" carbon (die) film and is well within the hardness range of chemically vapor-deposited diamond. Furthermore, this peak hardness is observed at an indentation depth of approximately 50 nm and not on the upper surface of the film. A structural analysis by transmission electron microscopy (TEM) has been conducted in order to explain these mechanical phenomena.Details of the sputtering apparatus are described elsewhere. Films for this study were deposited on silicon using a two-step process in which a thin layer, approximately 10 nm, was first deposited at a relatively high substrate bias (~2 kV) followed by growth of the majority of the film at a lower bias (~200 V). Plan-view examination of carbon films revealed both uniformly amorphous regions and extensive nanocrystalline phase regions.

Structural Characteristics of Diamond-Like Carbon Films Synthesized by Different Methods

2017 ◽  
Vol 743 ◽  
pp. 112-117
Author(s):  
Alexander Zolkin ◽  
Anna Semerikova ◽  
Sergey Chepkasov ◽  
Maksim Khomyakov
Keyword(s):  
Amorphous Phase ◽  
Ion Beam ◽  
High Energy ◽  
Carbon Films ◽  
Ion Source ◽  
Ordered Structure ◽  
Deposition Technique ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

In the present study, the Raman spectra of diamond-like amorphous (a-C) and hydrogenated amorphous (a-C:H) carbon films on silicon obtained using the ion-beam methods and the pulse cathodic arc deposition technique were investigated with the aim of elucidating the relation between the hardness and structure of the films. The hardness of the samples used in the present study was 19 – 45 GPa. Hydrogenated carbon films were synthesized using END–Hall ion sources and a linear anode layer ion source (LIS) on single-crystal silicon substrates. The gas precursors were CH4 and C3H8, and the rate of the gas flow fed into the ion source was 4.4 to 10 sccm. The ion energies ranged from 150 to 600 eV. a-C films were deposited onto Si substrates using the pulse cathodic arc deposition technique. The films obtained by the pulse arc technique contained elements with an ordered structure. In the films synthesized using low- (150 eV) and high-energy (600 eV) ions beams, an amorphous phase was the major phase. The significant blurriness of the diffraction rings in the electron diffraction patterns due to a large film thickness (180 – 250 nm) did not allow distinctly observing the signals from the elements with an ordered structure against the background of an amorphous phase.

scholarly journals Thermal stability of amorphous hard carbon films produced by cathodic arc deposition

1997 ◽  
Vol 71 (23) ◽  
pp. 3367-3369 ◽  
Author(s):  
Simone Anders ◽  
Javier Dı́az ◽  
Joel W. Ager ◽  
Roger Yu Lo ◽  
David B. Bogy
Keyword(s):  
Thermal Stability ◽  
Carbon Films ◽  
Hard Carbon ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition ◽  
Thermal Stability Of

Ultrathin amorphous carbon overcoats by filtered cathodic arc deposition

2003 ◽  
Vol 39 (5) ◽  
pp. 2201-2204 ◽  
Author(s):  
T. Yamamoto ◽  
H. Hyodo ◽  
S. Tsuchitani ◽  
R. Kaneko
Keyword(s):  
Amorphous Carbon ◽  
Cathodic Arc Deposition ◽  
Carbon Overcoats ◽  
Cathodic Arc ◽  
Arc Deposition

Microstructure of diamond-like carbon films prepared by cathodic arc deposition

2002 ◽  
Vol 11 (7) ◽  
pp. 1436-1440 ◽  
Author(s):  
Ayako Kimura ◽  
Yasushi Azuma ◽  
Tetsuya Suzuki ◽  
Tomohiro Saito ◽  
Yuichi Ikuhara
Keyword(s):  
Carbon Films ◽  
Diamond Like Carbon ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

scholarly journals Mechanical Properties of Amorphous Hard Carbon Films Prepared by Cathodic ARC Deposition

1995 ◽  
Vol 383 ◽  
Author(s):  
Simone Anders ◽  
André Anders ◽  
Joel W. Ager ◽  
Zhi Wang ◽  
George M. Pharr ◽  
...  
Keyword(s):  
Bias Voltage ◽  
Deposition Process ◽  
Carbon Films ◽  
Carbon Ions ◽  
Hard Carbon ◽  
Cathodic Arc Deposition ◽  
Transmission Electron ◽  
As Stress ◽  
Cathodic Arc ◽  
Arc Deposition

ABSTRACTCathodic arc deposition combined with macroparticle filtering of the plasma is an efficient and versatile method for the deposition of amorphous hard carbon films of high quality. The film properties can be tailored over a broad range by varying the energy of the carbon ions incident upon the substrate and upon the growing film by applying a pulsed bias technique. By varying the bias voltage during the deposition process specific properties of the interface, bulk film and top surface layer can be obtained. We report on nanoindentation and transmission electron microscopy studies as well as stress measurements of cathodic-arc amorphous hard carbon films deposited with varied bias voltage. The investigations were performed on multilayers consisting of alternating hard and soft amorphous carbon.

Mechanical Properties of AlCrTiSiN Coatings Developed by Cathodic Arc for Protection Applications

2012 ◽  
Vol 185 ◽  
pp. 81-83 ◽  
Author(s):  
Nurot Panich ◽  
Surasak Surinphong ◽  
D.A. Karpov ◽  
Yong Kwang Tan ◽  
Chin Foo Goh ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
High Hardness ◽  
Ceramic Coatings ◽  
Coating Adhesion ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Hardness Values ◽  
Arc Deposition ◽  
Deposition Techniques ◽  
Superhard Coatings

The aim of this work is to fabricate and develop the innovative ceramic coatings for protection applications with both high hardness and coating adhesion particularly performing in extremely environmental conditions. In this study, nanocomposite AlCrTiSiN coatings were developed and deposited on Carbide coupons (WC with Co binder) substrate using Cathodic Arc Deposition techniques. The resultant coatings were evaluated with respect to fundamental mechanical properties such as hardness, modulus and coating adhesion. It was found that the nanomposite AlCrTiSiN coatings has a good adhesion to the substrate and retained extremely high hardness as superhard coatings with hardness values above 50 GPa.

Structural and Mechanical Properties of Nanostructured TiAlCrN Thin Films Deposited by Cathodic Arc Deposition

2013 ◽  
Vol 32 (2) ◽  
pp. 107-111 ◽  
Author(s):  
N. Vattanaprateep ◽  
N. Panich ◽  
S. Surinphong ◽  
S. Tungasmita ◽  
P. Wangyao
Keyword(s):  
Thin Films ◽  
Elastic Modulus ◽  
Energy Dispersive Spectrometer ◽  
High Hardness ◽  
Film Material ◽  
Quaternary Compound ◽  
Good Thermal Stability ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition

AbstractThis work has aims to study and develop the novel nanostructural quaternary thin film material for cutting tools and other applications with both high hardness value and good thermal stability at high temperature. The quaternary compound of TiAlCrN superhard coating material was deposited on tungsten carbide (WC-Co) substrates using cathodic arc deposition techniques at the deposition temperature of 623 K. The structures of the coatings were fundamentally examined by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive spectrometer (EDS), and atomic force microscopy (AFM). The coating hardness and elastic modulus tests were performed and investigated by nanoindentation testing method. The maximum hardness and elastic modulus values as measured by nanoindentation tests are at 53 GPa and 887 GPa, respectively. Scratch tests were performed on thin films deposited in various conditions. The critical loads to the coating failure of the resultant coatings are above 75 N.

scholarly journals Hardness, elastic modulus, and structure of very hard carbon films produced by cathodic‐arc deposition with substrate pulse biasing

1996 ◽  
Vol 68 (6) ◽  
pp. 779-781 ◽  
Author(s):  
George M. Pharr ◽  
Daniel L. Callahan ◽  
Shaun D. McAdams ◽  
Ting Y. Tsui ◽  
Simone Anders ◽  
...  
Keyword(s):  
Elastic Modulus ◽  
Carbon Films ◽  
Hard Carbon ◽  
Cathodic Arc Deposition ◽  
Cathodic Arc ◽  
Arc Deposition
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