Suppression of Silver Diffusion in Borosilicate Glass-Based Low-Temperature Cofired Ceramics by Copper Oxide Addition

2016 ◽  
Vol 99 (7) ◽  
pp. 2402-2407 ◽  
Author(s):  
Mingsheng Ma ◽  
Zhifu Liu ◽  
Faqiang Zhang ◽  
Feng Liu ◽  
Yongxiang Li
Keyword(s):  
Low Temperature ◽  
Copper Oxide ◽  
Borosilicate Glass ◽  
Oxide Addition ◽  
Silver Diffusion ◽  
Cofired Ceramics

scholarly journals Low‐Temperature H 2 Reduction of Copper Oxide Subnanoparticles

2021 ◽  
Author(s):  
Kazutaka Sonobe ◽  
Makoto Tanabe ◽  
Takane Imaoka ◽  
Wang‐Jae Chun ◽  
Kimihisa Yamamoto
Keyword(s):  
Low Temperature ◽  
Copper Oxide

scholarly journals Improvement of Ni/Al2O3 Catalysts for Low-Temperature CO2 Methanation by Vanadium and Calcium Oxide Addition

2021 ◽  
Author(s):  
Gabriella Garbarino ◽  
Paweł Kowalik ◽  
Paola Riani ◽  
Katarzyna Antoniak-Jurak ◽  
Piotr Pieta ◽  
...  
Keyword(s):  
Low Temperature ◽  
Calcium Oxide ◽  
Co2 Methanation ◽  
Oxide Addition

Development of a mass flow sensor based on Low Temperature Cofired Ceramics for analysis of exhaust gas up to 500 °C

2020 ◽  
Author(s):  
Lohrberg Carolin ◽  
Lenz Christian ◽  
Kreher Lisa ◽  
Bechtold Franz ◽  
Carstens Stefan ◽  
...  
Keyword(s):  
Low Temperature ◽  
Mass Flow ◽  
Flow Sensor ◽  
Exhaust Gas ◽  
Cofired Ceramics ◽  
Mass Flow Sensor

Studies on three-dimensional moulding, bonding and assembling of low-temperature-cofired ceramics for MEMS and MST applications

2005 ◽  
Vol 89 (1) ◽  
pp. 72-79 ◽  
Author(s):  
P.K. Khanna ◽  
B. Hornbostel ◽  
M. Burgard ◽  
W. Schäfer ◽  
J. Dorner
Keyword(s):  
Low Temperature ◽  
Three Dimensional ◽  
Cofired Ceramics

scholarly journals Vortex Configuration Flow Cell Based on Low-Temperature Cofired Ceramics As a Compact Chemiluminescence Microsystem

2008 ◽  
Vol 80 (14) ◽  
pp. 5320-5324 ◽  
Author(s):  
Núria Ibáñez-García ◽  
Mar Puyol ◽  
Carlos M. Azevedo ◽  
Cynthia S. Martínez-Cisneros ◽  
Francisco Villuendas ◽  
...  
Keyword(s):  
Low Temperature ◽  
Flow Cell ◽  
Cofired Ceramics

Processing and Characterization of Amorphous Copper Oxide Thin Films Prepared by Reactive Magnetron Sputtering

2018 ◽  
Vol 775 ◽  
pp. 238-245 ◽  
Author(s):  
Thitinai Gaewdang ◽  
Ngamnit Wongcharoen
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Magnetron Sputtering ◽  
Copper Oxide ◽  
Flow Rate ◽  
Localized States ◽  
Positive Sign ◽  
Variable Range Hopping ◽  
Variable Range ◽  
Deposited Films

In this paper, copper oxide (CuOx) thin films with amorphous phase were prepared on glass substrates by reactive dc magnetron sputtering. The influence of the flow rate of O2 on the structural, optical and electrical properties of the as-deposited films was systematically studied. XRD revealed that the as-deposited films remained amorphous in the whole range of adjusted oxygen flow rate. Surface morphology and nanoparticle size of the films were observed by AFM. Electrical resistivity and Hall effect measurements were performed on the films with van der Pauw configuration. The positive sign of the Hall coefficient confirmed the p-type conductivity in all studied films. From temperature-dependent electrical conductivity of the films prepared at R(O2) of 1.5 sccm, it was show that three types of behavior can be expected, nearest-neighbor hopping at high temperature range (200-300 K), the Mott variable range hopping at low temperature (110-190 K) and Efros-Shklovskii variable range hopping at very low temperature (65-100 K). Some important parameters corresponding to Mott-VRH and ES-VRH like density of localized states near the Fermi level, localization length, degree of disorder, hopping distance and hopping energy were determined. These parameters would be helpful for optimizing the performance of photovoltaic applications.

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