Ideal and potential flexibility measures for qualification management in semiconductor manufacturing

Author(s):  
Amelie Pianne ◽  
Luis Rivero ◽  
Stephane Dauzere-Peres ◽  
Philippe Vialletelle
Author(s):  
Carl Johnzen ◽  
Philippe Vialletelle ◽  
Stephane Dauzere-Peres ◽  
Claude Yugma ◽  
Alexandre Derreumaux

Omega ◽  
2015 ◽  
Vol 54 ◽  
pp. 50-59 ◽  
Author(s):  
M. Rowshannahad ◽  
S. Dauzère-Pérès ◽  
B. Cassini

2010 ◽  
Vol 22 (1) ◽  
pp. 81-90 ◽  
Author(s):  
Carl Johnzén ◽  
Stéphane Dauzère-Pérès ◽  
Philippe Vialletelle

Author(s):  
Anqi Qiu ◽  
William Lowe ◽  
Mridul Arora

Abstract Nanoprobing systems have evolved to meet the challenges from recent innovations in the semiconductor manufacturing process. This is demonstrated through an exhibition of standard SRAM measurements on TSMC 7 nm FinFET technology. SEM based nanoprober is shown to meet or exceed the requirements for measuring 7nm technology and beyond. This paper discusses in detail of the best-known methods for nanoprobing on 7nm technology.


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