Low Temperature Deposition of Hydrogenated Nanocrystalline Cubic Silicon Carbide Thin Films by HWCVD and VHF-PECVD
Low Temperature (320°C) Deposition of Hydrogenated Microcrystalline Cubic Silicon Carbide Thin Films
2004 ◽
Vol 457-460
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pp. 317-320
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2008 ◽
Vol 202
(10)
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pp. 2126-2131
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Keyword(s):
1997 ◽
Vol 48
(1-4)
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pp. 269-277
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1998 ◽
Vol 21
(1-4)
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pp. 355-366
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