Ultra Low Voltage Operation with Bootstrap Scheme for Single Power Supply SOI-SRAM

2007 ◽  
Author(s):  
Masaaki Iijima ◽  
Masayuki Kitamura ◽  
Masahiro Numa ◽  
Akira Tada ◽  
Takashi Ipposhi
Keyword(s):  
Power Supply ◽  
Low Voltage ◽  
Low Voltage Operation ◽  
Single Power

A Sub-1 V Bulk-Driven Rail to Rail Dynamic Voltage Comparator with Enhanced Transconductance

2021 ◽  
Author(s):  
George M. Joseph ◽  
T. A.Shahul Hameed
Keyword(s):  
Input Signal ◽  
Power Supply ◽  
Dynamic Range ◽  
Low Voltage ◽  
Worst Case ◽  
Additional Advantage ◽  
Silicon Area ◽  
Voltage Comparator ◽  
Low Voltage Operation ◽  
Rail To Rail

Reduced voltage head room availability for input signal swing is one of the major bottlenecks in the design of circuits operating with low supply voltages which attracts investigations leading to improvement in the input signal dynamic range of such circuits. Employing bulk-driven MOSFETs (BDMOS) at the input section of the circuit is a popular technique used for increasing the input dynamic range, but the smaller bulk transconductance of the bulk-driven MOSFET degrades the performance of the circuit in comparison with that of a conventional gate-driven counterpart. A double tail voltage comparator employing BDMOS technique offering rail-to-rail input dynamic range and capable of operating at sub-1[Formula: see text]V power supply is presented in this paper. A transconductance improvement scheme is employed for the first time in the literature for a voltage comparator to overcome the major drawbacks associated with the reduced bulk transconductance of BDMOS input transistors and double tail topology permits low voltage operation. The performance parameters of the proposed voltage comparator are comparable to that of conventional gate-driven comparators, with an additional advantage of rail-to-rail input dynamic range. Pre-layout and post-layout simulations were performed in Cadence Virtuoso suite with gpdk 90[Formula: see text]nm library at power supply as low as 0.6[Formula: see text]V. The worst case delay of the proposed circuit is 0.71[Formula: see text]ns and the worst case power consumption of the circuit is 15[Formula: see text]uW. The circuit consumes a silicon area of 33[Formula: see text]μm[Formula: see text]46[Formula: see text]μm. An analytical model of the transconductance enhancement technique and delay of the proposed comparator are also presented.

Current State of Biological High-Resolution Scanning Electron Microscopy

1988 ◽  
Vol 46 ◽  
pp. 180-181 ◽  
Author(s):  
Klaus-Ruediger Peters
Keyword(s):  
High Performance ◽  
Low Voltage ◽  
Backscattered Electrons ◽  
Lens Position ◽  
Low Voltage Operation ◽  
Signal Collection ◽  
Probe Size ◽  
Electron Microscopes ◽  
Scanning Electron Microscopes ◽  
Scanning Electron

A new generation of high performance field emission scanning electron microscopes (FSEM) is now commercially available (JEOL 890, Hitachi S 900, ISI OS 130-F) characterized by an "in lens" position of the specimen where probe diameters are reduced and signal collection improved. Additionally, low voltage operation is extended to 1 kV. Compared to the first generation of FSEM (JE0L JSM 30, Hitachi S 800), which utilized a specimen position below the final lens, specimen size had to be reduced but useful magnification could be impressively increased in both low (1-4 kV) and high (5-40 kV) voltage operation, i.e. from 50,000 to 200,000 and 250,000 to 1,000,000 x respectively.At high accelerating voltage and magnification, contrasts on biological specimens are well characterized1 and are produced by the entering probe electrons in the outmost surface layer within -vl nm depth. Backscattered electrons produce only a background signal. Under these conditions (FIG. 1) image quality is similar to conventional TEM (FIG. 2) and only limited at magnifications >1,000,000 x by probe size (0.5 nm) or non-localization effects (%0.5 nm).

High resolution at low voltage: A new approach

1989 ◽  
Vol 47 ◽  
pp. 76-77
Author(s):  
Arthur V. Jones
Keyword(s):  
Low Voltage ◽  
Emission Sources ◽  
New Approach ◽  
Design Concepts ◽  
Probe Diameter ◽  
Low Voltage Operation ◽  
Sufficient Intensity ◽  
Electron Microscopes ◽  
Scanning Electron Microscopes ◽  
Immersion Type

With the introduction of field-emission sources and “immersion-type” objective lenses, the resolution obtainable with modern scanning electron microscopes is approaching that obtainable in STEM and TEM-but only with specific types of specimens. Bulk specimens still suffer from the restrictions imposed by internal scattering and the need to be conducting. Advances in coating techniques have largely overcome these problems but for a sizeable body of specimens, the restrictions imposed by coating are unacceptable.For such specimens, low voltage operation, with its low beam penetration and freedom from charging artifacts, is the method of choice.Unfortunately the technical dificulties in producing an electron beam sufficiently small and of sufficient intensity are considerably greater at low beam energies — so much so that a radical reevaluation of convential design concepts is needed.The probe diameter is usually given by

Low-voltage operation of the organic thin film transistor with a diagonal configuration

2003 ◽  
Author(s):  
Toshihide Kamata ◽  
Manabu Yoshida ◽  
Sei Uemura ◽  
Satoshi Hoshino ◽  
Noriyuki Takada ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Voltage ◽  
Thin Film Transistor ◽  
Organic Thin Film ◽  
Organic Thin Film Transistor ◽  
Low Voltage Operation
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