Modeling the influence of arsenic autodoping on the sheet resistance of epitaxial silicon films and its application to statistical process control (SPC)
2003 ◽
Vol 16
(1)
◽
pp. 68-75
◽
Keyword(s):
2014 ◽
Vol 2014
(2)
◽
pp. 86-97
2017 ◽
Vol 7
(3)
◽
pp. 208