scholarly journals In-Depth Analysis on Radiation Induced Multi-Level Dark Current Random Telegraph Signal in Silicon Solid State Image Sensors

2017 ◽  
Vol 64 (1) ◽  
pp. 19-26 ◽  
Author(s):  
Clementine Durnez ◽  
Vincent Goiffon ◽  
Cedric Virmontois ◽  
Jean-Marc Belloir ◽  
Pierre Magnan ◽  
...  
2018 ◽  
Vol 65 (1) ◽  
pp. 92-100 ◽  
Author(s):  
Clementine Durnez ◽  
Vincent Goiffon ◽  
Cedric Virmontois ◽  
Serena Rizzolo ◽  
Alexandre Le Roch ◽  
...  

2020 ◽  
Vol 67 (7) ◽  
pp. 1241-1250
Author(s):  
Alexandre Le Roch ◽  
Cedric Virmontois ◽  
Philippe Paillet ◽  
Jean-Marc Belloir ◽  
Serena Rizzolo ◽  
...  

Sensors ◽  
2019 ◽  
Vol 19 (24) ◽  
pp. 5534
Author(s):  
Yolène Sacchettini ◽  
Jean-Pierre Carrère ◽  
Romain Duru ◽  
Jean-Pierre Oddou ◽  
Vincent Goiffon ◽  
...  

Plasma processes are known to be prone to inducing damage by charging effects. For CMOS image sensors, this can lead to dark current degradation both in value and uniformity. An in-depth analysis, motivated by the different degrading behavior of two different plasma processes, has been performed in order to determine the degradation mechanisms associated with one plasma process. It is based on in situ plasma-induced charge characterization techniques for various dielectric stack structures (dielectric nature and stack configuration). A degradation mechanism is proposed, highlighting the role of ultraviolet (UV) light from the plasma in creating an electron hole which induces positive charges in the nitride layer at the wafer center, and negative ones at the edge. The trapped charges de-passivate the SiO2/Si interface by inducing a depleted interface above the photodiode, thus emphasizing the generation of dark current. A good correlation between the spatial distribution of the total charges and the value of dark current has been observed.


2013 ◽  
Vol 60 (6) ◽  
pp. 4323-4331 ◽  
Author(s):  
Cedric Virmontois ◽  
Vincent Goiffon ◽  
Mark S. Robbins ◽  
Laurie Tauziede ◽  
Herve Geoffray ◽  
...  

2007 ◽  
Vol 994 ◽  
Author(s):  
Cristian Tivarus ◽  
William C. McColgin

AbstractDark current spectroscopy (DCS) is used to study deep level traps corresponding to the bright pixels that form the histogram “tails” of irradiated charge-coupled devices (CCD). We found four distinct traps, among which the double vacancy (V2) and the vacancy-phosphorous (VP) have the highest concentrations and generation rates. We show that DCS can be used to examine the annealing mechanisms of silicon defects to concentrations as low as 5 × 107 cm−3.


2012 ◽  
Vol 59 (4) ◽  
pp. 918-926 ◽  
Author(s):  
V. Goiffon ◽  
C. Virmontois ◽  
P. Magnan ◽  
P. Cervantes ◽  
S. Place ◽  
...  

2020 ◽  
Vol 19 ◽  
pp. 103443
Author(s):  
Bingkai Liu ◽  
Yudong Li ◽  
Lin Wen ◽  
Dong Zhou ◽  
Jie Feng ◽  
...  

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