Effect of the Sputtering Power Density on Microstructure and Magnetic Properties of CoFeSiB Thin Films

2011 ◽  
Vol 47 (10) ◽  
pp. 3886-3888
Author(s):  
M. Grigoras ◽  
N. Lupu ◽  
H. Chiriac
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Power Density ◽  
Sputtering Power ◽  
Microstructure And Magnetic Properties

Effects of Sputtering Conditions on Texture, Microstructure and Magnetic Properties of the CoCrPt/NiAl Thin Films

1998 ◽  
Vol 517 ◽  
Author(s):  
Y.-N. Hsu ◽  
D. E. Laughlin ◽  
D. N. Lambeth
Keyword(s):  
Thin Films ◽  
Grain Size ◽  
Magnetic Properties ◽  
Optimum Pressure ◽  
Grain Sizes ◽  
Maximum Value ◽  
Sputtering Power ◽  
Sputtering Pressure ◽  
The Relationship ◽  
Microstructure And Magnetic Properties

AbstractThe effects of sputtering argon pressures and sputtering power on the microstructure, texture and magnetic properties of NiAI underlayers on CoCrPt films were investigated. In this paper, the relationship between the sputtering conditions, microstructure, crystallographic texture and magnetic properties of these thin films will be discussed. By controlling the sputtering pressure and sputtering power, the texture and microstructure of NiAI underlayers were found to vary. This in turn was found to influence the magnetic properties of CoCrPt thin films. It was found that 10 mtorr is the optimum pressure to deposit the NiAl thin films to obtain the best magnetic properties for our system. At this argon pressure, the coercivity reached a maximum value because of the strongest CoCrPt (1010) texture and smallest grain size. At lower argon pressures (< 10 mtorr), NiAI tended to have a (110) texture reducing the CoCrPt (1010) texture, which in turn reduced the CoCrPt coercivity and S*. Also, high NiAl deposition pressures (>30 mtorr) yielded larger grains and a weaker CoCrPt (1010) texture, thereby decreasing the coercivity of the CoCrPt films. Increasing the sputtering power has been found to increase the CoCrPt coercivity and S* value. However, the grain sizes of the CoCrPt/NiAl thin films deposited at higher sputtering power were larger than those obtained at lower sputtering power.

Influence of vanadium concentration on the microstructure and magnetic properties of V-doped ZnO thin films

2010 ◽  
Vol 518 (19) ◽  
pp. 5505-5508 ◽  
Author(s):  
Ts. Naydenova ◽  
P. Atanasov ◽  
M. Koleva ◽  
N. Nedialkov ◽  
J. Perriere ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Zno Thin Films ◽  
Vanadium Concentration ◽  
Doped Zno ◽  
Microstructure And Magnetic Properties

Effects of RF magnetron sputtering power density on NTC characteristics of Mn–Co–Ni thin films

2012 ◽  
Vol 24 (4) ◽  
pp. 1203-1207 ◽  
Author(s):  
Guanhuan Lei ◽  
Hongwei Chen ◽  
Shanxue Zheng ◽  
Feizhi Lou ◽  
Linling Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Power Density ◽  
Rf Magnetron Sputtering ◽  
Sputtering Power
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