Thermal Stability of Ultrathin Amorphous Carbon Films for Energy-Assisted Magnetic Recording

2011 ◽  
Vol 47 (9) ◽  
pp. 2277-2282 ◽  
Author(s):  
N. Wang ◽  
K. Komvopoulos
Keyword(s):  
Thermal Stability ◽  
Amorphous Carbon ◽  
Magnetic Recording ◽  
Carbon Films ◽  
Amorphous Carbon Films ◽  
Thermal Stability Of

Thermal stability of amorphous carbon films grown by pulsed laser deposition

1996 ◽  
Vol 68 (12) ◽  
pp. 1643-1645 ◽  
Author(s):  
T. A. Friedmann ◽  
K. F. McCarty ◽  
J. C. Barbour ◽  
M. P. Siegal ◽  
Dean C. Dibble
Keyword(s):  
Thermal Stability ◽  
Pulsed Laser Deposition ◽  
Amorphous Carbon ◽  
Pulsed Laser ◽  
Carbon Films ◽  
Laser Deposition ◽  
Amorphous Carbon Films ◽  
Thermal Stability Of

Effect of nitrogen addition on the properties and thermal stability of fluorinated amorphous carbon films

2006 ◽  
Vol 510 (1-2) ◽  
pp. 125-133 ◽  
Author(s):  
Chia-Han Lai ◽  
Wei-Shun Lai ◽  
Hua-Chun Chiue ◽  
Hung-Jen Chen ◽  
Shou-Yi Chang ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Amorphous Carbon ◽  
Nitrogen Addition ◽  
Carbon Films ◽  
Amorphous Carbon Films ◽  
Thermal Stability Of

Thermal stability of amorphous carbon films deposited by pulsed laser ablation

2000 ◽  
Vol 71 (4) ◽  
pp. 433-439 ◽  
Author(s):  
S. Rey ◽  
F. Antoni ◽  
B. Prevot ◽  
E. Fogarassy ◽  
J.C. Arnault ◽  
...  
Keyword(s):  
Thermal Stability ◽  
Laser Ablation ◽  
Amorphous Carbon ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Carbon Films ◽  
Amorphous Carbon Films ◽  
Thermal Stability Of

scholarly journals Thermal stability and diffusion characteristics of ultrathin amorphous carbon films grown on crystalline and nitrogenated silicon substrates by filtered cathodic vacuum arc deposition

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
Shengxi Wang ◽  
Anurag Roy ◽  
Kyriakos Komvopoulos
Keyword(s):  
Thermal Stability ◽  
Amorphous Carbon ◽  
Silicon Substrate ◽  
Elevated Temperatures ◽  
Carbon Films ◽  
Vacuum Arc ◽  
Cross Sectional ◽  
Prolonged Heating ◽  
Filtered Cathodic Vacuum Arc ◽  
Thermal Stability Of

AbstractAmorphous carbon (a-C) films are widely used as protective overcoats in many technology sectors, principally due to their excellent thermophysical properties and chemical inertness. The growth and thermal stability of sub-5-nm-thick a-C films synthesized by filtered cathodic vacuum arc on pure (crystalline) and nitrogenated (amorphous) silicon substrate surfaces were investigated in this study. Samples of a-C/Si and a-C/SiNx/Si stacks were thermally annealed for various durations and subsequently characterized by high-resolution transmission electron microscopy (TEM) and electron energy loss spectroscopy (EELS). The TEM images confirmed the continuity and uniformity of the a-C films and the 5-nm-thick SiNx underlayer formed by silicon nitrogenation using radio-frequency sputtering. The EELS analysis of cross-sectional samples revealed the thermal stability of the a-C films and the efficacy of the SiNx underlayer to prevent carbon migration into the silicon substrate, even after prolonged heating. The obtained results provide insight into the important attributes of an underlayer in heated multilayered media for preventing elemental intermixing with the substrate, while preserving the structural stability of the a-C film at the stack surface. An important contribution of this investigation is the establishment of an experimental framework for accurately assessing the thermal stability and elemental diffusion in layered microstructures exposed to elevated temperatures.

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