Post BF/sub 2//sup +/ implant annealing using single wafer rapid thermal furnace

12th IEEE International Conference on Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. ◽

10.1109/rtp.2004.1441949 ◽

2005 ◽

Author(s):

T. Fukada ◽

Woo Sik Yoo

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