Effects of radiative properties of surfaces on radiometric temperature measurement

2002 ◽  
Author(s):  
Y.H. Zhou ◽  
Z.M. Zhang ◽  
D.P. DeWitt ◽  
B.K. Tsai
Keyword(s):  
Temperature Measurement ◽  
Radiative Properties ◽  
Radiometric Temperature Measurement

Temperature Measurement Issues in Rapid Thermal Processing

1997 ◽  
Vol 470 ◽  
Author(s):  
D. P. DeWitt ◽  
F. Y. Sorrell ◽  
J. K. Elliott
Keyword(s):  
Temperature Measurement ◽  
Thermal Processing ◽  
Radiation Effects ◽  
Temperature Scale ◽  
Rapid Thermal Processing ◽  
Radiative Properties ◽  
Spectral Radiance ◽  
Roughness Effects ◽  
Thermal Radiative Properties ◽  
Stray Radiation

ABSTRACTReliable radiometrie temperature measurement has been a major challenge in making rapid thermal processing (RTP) more widely accepted. In order to meet road map requirements involving temperature uncertainty, uniformity and control, new techniques must be demonstrated and/or existing measurement methods must be substantially improved. Critical aspects of radiometrie methods for temperature measurement are centered about the topics: radiative and optical properties of the wafers including layered systems, surface roughness effects, and reflected irradiation from lamp banks and chamber walls. The systematic method for inferring temperature is rooted in the measurement equation which relates the radiometer output to the exitent spectral radiance from the target which reaches the detector and prescribes the roles that emissivity variability and stray radiation have on the result. An overview is provided on the knowledge base for optical and thermal radiative properties. Methods for reducing emissivity and stray radiation effects are summarized. Calibration procedures necessary to assure that the in-chamber or local temperature scale is traceable to the International Temperature Scale (ITS-90) are discussed. The issues which can impact improved temperature measurement practice are summarized.

Meeting RTP Temperature Accuracy Requirements: Measurement and Calibrations at Nist

1998 ◽  
Vol 525 ◽  
Author(s):  
F. J. Lovas ◽  
B. K. Tsai ◽  
C. E. Gibson
Keyword(s):  
Uncertainty Analysis ◽  
Temperature Measurement ◽  
Line Width ◽  
Thermal Processing ◽  
Rapid Thermal Processing ◽  
Temperature Calibration ◽  
Technical Challenge ◽  
Technology Roadmap ◽  
Radiometric Temperature Measurement ◽  
National Technology

ABSTRACTAlthough radiometric temperature measurement in rapid thermal processing (RTP) tools has substantially improved in terms of repeatability and uniformity, it still remains a technical challenge. The 1999 requirements of 180 nm line width technology in the 1997 National Technology Roadmap for Semiconductors (NTRS) imply an uncertainty of ± 2 °C in temperature measurement, which will continue the challenge in temperature measurement. In this paper we will discuss the NIST absolute radiometric temperature calibration, measurements, and uncertainty analysis.

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