scholarly journals In-situ characterization of the amorphous to microcrystalline transition in hot wire CVD growth of Si:H using real time spectroscopic ellipsometry

2003 ◽  
Author(s):  
D.H. Levi ◽  
B.P. Nelson ◽  
J.D. Perkins ◽  
H.R. Moutinho
Keyword(s):  
Real Time ◽  
Spectroscopic Ellipsometry ◽  
Hot Wire ◽  
In Situ Characterization ◽  
Cvd Growth

Real Time Spectroscopic Ellipsometry: In Situ Characterization of Pyrrole Electropolymerization

1991 ◽  
Vol 138 (11) ◽  
pp. 3266-3275 ◽  
Author(s):  
Y. ‐T. Kim ◽  
R. W. Collins ◽  
K. Vedam ◽  
D. L. Allara
Keyword(s):  
Real Time ◽  
Spectroscopic Ellipsometry ◽  
In Situ Characterization

In Situ Characterization of Metallorganic Chemical Vapor Deposition

1989 ◽  
Vol 158 ◽  
Author(s):  
R. Scarmozzino ◽  
T. Cacouris ◽  
R.M. Osgood
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
In Situ Characterization ◽  
Novel Technique ◽  
Cvd Growth ◽  
Laser Cvd ◽  
Metallization Process

ABSTRACTIn situ measurement of resistance has been used for the realtime monitoring of metallorganic chemical vapor deposition (CVD) growth characteristics. In particular, a novel technique for measuring metallorganic CVD activation energies is presented. The micron scale geometry of the experiment makes it relevant to work in localized laser CVD. The technique has been used to measure the CVD activation energy of dimethylaluminum hydride (DMAlH). In addition, a variant of the technique has been used to study the growth stage of a resistless two-step metallization process (nucleation / selective CVD) employing DMAIH as the source gas in both steps.

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