Weakly ionized plasma channel by accumulation effect of charged particles using high repetition rate excimer laser

2002 ◽  
Author(s):  
M. Yamaura ◽  
N. Hayashi ◽  
S. Ihara ◽  
S. Satoh ◽  
C. Yamabe
Keyword(s):  
Excimer Laser ◽  
Repetition Rate ◽  
Plasma Channel ◽  
Charged Particles ◽  
High Repetition Rate ◽  
High Repetition ◽  
Accumulation Effect ◽  
Weakly Ionized ◽  
Weakly Ionized Plasma

Lifetime evaluation of weakly ionized plasma channel by accumulation effect of charged particles by means of laser absorption

2004 ◽  
Vol 95 (11) ◽  
pp. 6007-6010 ◽  
Author(s):  
Michiteru Yamaura ◽  
Nobuya Hayashi ◽  
Satoshi Ihara ◽  
Saburoh Satoh ◽  
Chobei Yamabe
Keyword(s):  
Plasma Channel ◽  
Charged Particles ◽  
Laser Absorption ◽  
Accumulation Effect ◽  
Weakly Ionized ◽  
Weakly Ionized Plasma

5 kHz high repetition rate and high power XeCl excimer laser

1995 ◽  
Vol 66 (11) ◽  
pp. 5162-5164 ◽  
Author(s):  
Tatsumi Goto ◽  
Koji Kakizaki ◽  
Shigeyuki Takagi ◽  
Noboru Okamoto ◽  
Saburo Sato ◽  
...  
Keyword(s):  
Excimer Laser ◽  
High Power ◽  
Repetition Rate ◽  
High Repetition Rate ◽  
High Repetition ◽  
Xecl Excimer Laser

High-repetition-rate XeC1 Excimer Laser

1994 ◽  
pp. 199-202
Author(s):  
Saburoh Satoh ◽  
Noboru Okamoto ◽  
Kohji Kakizaki ◽  
Shigeyuki Takagi ◽  
Ken Ishikawa ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Repetition Rate ◽  
High Repetition Rate ◽  
High Repetition

High-repetition-rate ArF excimer laser for microlithography

2000 ◽  
Author(s):  
Osamu Wakabayashi ◽  
Tatsuo Enami ◽  
Ken Ishii ◽  
Katsutomo Terashima ◽  
Yasuo Itakura ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Repetition Rate ◽  
High Repetition Rate ◽  
High Repetition ◽  
Arf Excimer Laser
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