Optical emission spectroscopy characterization of low temperature plasma created in water

2006 ◽  
Author(s):  
U. Cvelbar ◽  
M. Mozeti ◽  
A. Drenik ◽  
N. Krstulovi ◽  
S. Miloseviae
Keyword(s):  
Low Temperature ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Low Temperature Plasma ◽  
Temperature Plasma

Detecting Trace Gases at Ppm Levels with Low Temperature Plasma Optical Emission Spectroscopy

2020 ◽  
Vol MA2020-01 (26) ◽  
pp. 1851-1851
Author(s):  
Paul Maguire ◽  
Tahereh Shah-Mansouri ◽  
Jordan Vincent ◽  
Hui Wang ◽  
Omar Nibouche
Keyword(s):  
Low Temperature ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Trace Gases ◽  
Optical Emission ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Plasma Optical Emission Spectroscopy

Detecting Trace Gases at PPM Levels with Low Temperature Plasma Optical Emission Spectroscopy

2021 ◽  
Vol MA2021-01 (54) ◽  
pp. 1316-1316
Author(s):  
PAUL Maguire ◽  
Tahereh Shah-Mansouri ◽  
Jordan Vincent ◽  
Hui Wang ◽  
Omar Nibouche
Keyword(s):  
Low Temperature ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Trace Gases ◽  
Optical Emission ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Plasma Optical Emission Spectroscopy

Analysis of Low-Temperature Plasma by Optical Emission Spectroscopy with Spatial Scanning

2021 ◽  
Vol 64 (5) ◽  
pp. 700-704
Author(s):  
R. R. Ismagilov ◽  
A. B. Loginov ◽  
S. A. Malykhin ◽  
V. I. Kleshch ◽  
A. N. Obraztsov
Keyword(s):  
Low Temperature ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Low Temperature Plasma ◽  
Temperature Plasma

Applicability of optical emission spectroscopy techniques for characterization of Ar and Ar/O2 discharges

2021 ◽  
Vol 54 (27) ◽  
pp. 275203
Author(s):  
M Nikolić ◽  
I Sepulveda ◽  
C Gonzalez ◽  
N Khogeer ◽  
M Fernandez-Monteith
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission

Electrical Characterization of Low Temperature PECVD Oxides for TSV Applications

2018 ◽  
Vol 2018 (1) ◽  
pp. 000728-000733
Author(s):  
Piotr Mackowiak ◽  
Rachid Abdallah ◽  
Martin Wilke ◽  
Jash Patel ◽  
Huma Ashraf ◽  
...  
Keyword(s):  
Low Temperature ◽  
Electrical Characterization ◽  
Chemical Vapor ◽  
Silicon Substrates ◽  
Low Temperature Plasma ◽  
Temperature Plasma ◽  
Charge Densities ◽  
Doped Silicon

Abstract In the present work we investigate the quality of low temperature Plasma Enhanced Chemical Vapor Deposition (PECVD) and plasma treated Tetraethyl orthosilicate (TEOS)-based TSV-liner films. Different designs of Trough Silicon Via (TSV) Test structures with 10μm and 20μm width and a depth of 100μm have been fabricated. Two differently doped silicon substrates have been used – highly p-doped and moderately doped. The results for break-through, resistivity and capacitance for the 20μm structures show a better performance compared to the 10μm structures. This is mainly due to increased liner thickness in the reduced aspect ratio case. Lower interface traps and oxide charge densities have been observed in the C-V measurements results for the 10μm structures.

Experimental characterization of argon/air mixture microwave plasmas using optical emission spectroscopy

2020 ◽  
Vol 370 ◽  
pp. 111278 ◽  
Author(s):  
Sébastien Rassou ◽  
Alain Piquemal ◽  
Nofel Merbahi ◽  
Fréderic Marchal ◽  
Mohammed Yousfi
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Experimental Characterization ◽  
Microwave Plasmas
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