Generation of ultrashort relativistic electron bunches (electron mirrors) with super-intense laser pulses

2004 ◽  
Author(s):  
V.A. Cherepenin ◽  
V.N. Kornienko ◽  
V.V. Kulagin ◽  
V.V. Valuev
Keyword(s):  
Relativistic Electron ◽  
Laser Pulses ◽  
Intense Laser ◽  
Electron Bunches ◽  
Intense Laser Pulses

scholarly journals Concept of generation of extremely compressed high-energy electron bunches in several interfering intense laser pulses with tilted amplitude fronts

2012 ◽  
Vol 31 (1) ◽  
pp. 23-28 ◽  
Author(s):  
V.V. Korobkin ◽  
M.Yu. Romanovskiy ◽  
V.A. Trofimov ◽  
O.B. Shiryaev
Keyword(s):  
Laser Pulses ◽  
High Energy ◽  
Intense Laser ◽  
High Energy Electron ◽  
Speed Of Light ◽  
Electron Bunches ◽  
Newton Equation ◽  
High Energies ◽  
Neutral Gas ◽  
Intense Laser Pulses

AbstractA new concept of generating tight bunches of electrons accelerated to high energies is proposed. The electrons are born via ionization of a low-density neutral gas by laser radiation, and the concept is based on the electrons acceleration in traps arising within the pattern of interference of several relativistically intense laser pulses with amplitude fronts tilted relative to their phase fronts. The traps move with the speed of light and (1) collect electrons; (2) compress them to extremely high density in all dimensions, forming electron bunches; and (3) accelerate the resulting bunches to energies of at least several GeV per electron. The simulations of bunch formation employ the Newton equation with the corresponding Lorentz force.

scholarly journals Longitudinal and transverse cooling of relativistic electron beams in intense laser pulses

2015 ◽  
Vol 17 (5) ◽  
pp. 053025 ◽  
Author(s):  
Samuel R Yoffe ◽  
Yevgen Kravets ◽  
Adam Noble ◽  
Dino A Jaroszynski
Keyword(s):  
Relativistic Electron ◽  
Electron Beams ◽  
Laser Pulses ◽  
Intense Laser ◽  
Relativistic Electron Beams ◽  
Intense Laser Pulses

scholarly journals High laser induced damage threshold photoresists for nano-imprint and 3D multi-photon lithography

Nanophotonics ◽  
2021 ◽  
Vol 0 (0) ◽  
Author(s):  
Elmina Kabouraki ◽  
Vasileia Melissinaki ◽  
Amit Yadav ◽  
Andrius Melninkaitis ◽  
Konstantina Tourlouki ◽  
...  
Keyword(s):  
Nanoimprint Lithography ◽  
Three Dimensional ◽  
Damage Threshold ◽  
Laser Pulses ◽  
Intense Laser ◽  
Optical Elements ◽  
Photonic Circuits ◽  
Future Production ◽  
Intense Laser Pulses ◽  
Laser Induced Damage

Abstract Optics manufacturing technology is predicted to play a major role in the future production of integrated photonic circuits. One of the major drawbacks in the realization of photonic circuits is the damage of optical materials by intense laser pulses. Here, we report on the preparation of a series of organic–inorganic hybrid photoresists that exhibit enhanced laser-induced damage threshold. These photoresists showed to be candidates for the fabrication of micro-optical elements (MOEs) using three-dimensional multiphoton lithography. Moreover, they demonstrate pattern ability by nanoimprint lithography, making them suitable for future mass production of MOEs.

scholarly journals Precise description of single and double ionization of hydrogen molecule in intense laser pulses

2012 ◽  
Vol 137 (4) ◽  
pp. 044112 ◽  
Author(s):  
Mohsen Vafaee ◽  
Firoozeh Sami ◽  
Babak Shokri ◽  
Behnaz Buzari ◽  
Hassan Sabzyan
Keyword(s):  
Hydrogen Molecule ◽  
Laser Pulses ◽  
Double Ionization ◽  
Intense Laser ◽  
Precise Description ◽  
Intense Laser Pulses
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