Electron cloud effects in present and future high intensity hadron machines

Author(s):  
M. Blaskiewicz
Author(s):  
H. Rose

The scanning transmission electron microscope offers the possibility of utilizing inelastically scattered electrons. Use of these electrons in addition to the elastically scattered electrons should reduce the scanning time (dose) Which is necessary to keep the quantum noise below a certain level. Hence it should lower the radiation damage. For high resolution, Where the collection efficiency of elastically scattered electrons is small, the use of Inelastically scattered electrons should become more and more favorable because they can all be detected by means of a spectrometer. Unfortunately, the Inelastic scattering Is a non-localized interaction due to the electron-electron correlation, occurring predominantly at the circumference of the atomic electron cloud.


Author(s):  
George Christov ◽  
Bolivar J. Lloyd

A new high intensity grid cap has been designed for the RCA-EMU-3 electron microscope. Various parameters of the new grid cap were investigated to determine its characteristics. The increase in illumination produced provides ease of focusing on the fluorescent screen at magnifications from 1500 to 50,000 times using an accelerating voltage of 50 KV.The EMU-3 type electron gun assembly consists of a V-shaped tungsten filament for a cathode with a thin metal threaded cathode shield and an anode with a central aperture to permit the beam to course the length of the column. The cathode shield is negatively biased at a potential of several hundred volts with respect to the filament. The electron beam is formed by electrons emitted from the tip of the filament which pass through an aperture of 0.1 inch diameter in the cap and then it is accelerated by the negative high voltage through a 0.625 inch diameter aperture in the anode which is at ground potential.


2006 ◽  
Vol 175 (4S) ◽  
pp. 86-86
Author(s):  
Makoto Sumitomo ◽  
Junichi Asakuma ◽  
Yasumasa Hanawa ◽  
Kazuhiko Nagakura ◽  
Masamichi Hayakawa

2005 ◽  
Vol 173 (4S) ◽  
pp. 379-380
Author(s):  
James E. Kennedy ◽  
Rowland O. Illing ◽  
Feng Wu ◽  
Gail R. ter Haar ◽  
Rachel R. Phillips ◽  
...  

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