scholarly journals A trio of modulators for the Fermilab Tevatron Electron Lens project

2002 ◽  
Author(s):  
D. Wildman ◽  
V. Shiltsev ◽  
N. Solyak ◽  
V. Efanov ◽  
P. Yarin
Keyword(s):  
Electron Lens

Resolution in photoelectron microscopy

1991 ◽  
Vol 49 ◽  
pp. 458-459
Author(s):  
G. F. Rempfer
Keyword(s):  
Electron Microscopy ◽  
Electric Field ◽  
Ultraviolet Light ◽  
Uniform Field ◽  
Virtual Image ◽  
Lens System ◽  
Photoemission Electron Microscopy ◽  
Planar Electrode ◽  
Electron Lens ◽  
Photoemission Electron

In photoelectron microscopy (PEM), also called photoemission electron microscopy (PEEM), the image is formed by electrons which have been liberated from the specimen by ultraviolet light. The electrons are accelerated by an electric field before being imaged by an electron lens system. The specimen is supported on a planar electrode (or the electrode itself may be the specimen), and the accelerating field is applied between the specimen, which serves as the cathode, and an anode. The accelerating field is essentially uniform except for microfields near the surface of the specimen and a diverging field near the anode aperture. The uniform field forms a virtual image of the specimen (virtual specimen) at unit lateral magnification, approximately twice as far from the anode as is the specimen. The diverging field at the anode aperture in turn forms a virtual image of the virtual specimen at magnification 2/3, at a distance from the anode of 4/3 the specimen distance. This demagnified virtual image is the object for the objective stage of the lens system.

The Added Value of Graphical Input and Display for Electron Lens Design

1990 ◽  
Vol 48 (1) ◽  
pp. 190-191
Author(s):  
B. Lencova ◽  
G. Wisselink
Keyword(s):  
Flux Density ◽  
Numerical Data ◽  
Added Value ◽  
Lens Design ◽  
Step Size ◽  
Magnetic Lens ◽  
Flux Lines ◽  
Fine Mesh ◽  
Electron Lens ◽  
User Friendly

Recent progress in computer technology enables the calculation of lens fields and focal properties on commonly available computers such as IBM ATs. If we add to this the use of graphics, we greatly increase the applicability of design programs for electron lenses. Most programs for field computation are based on the finite element method (FEM). They are written in Fortran 77, so that they are easily transferred from PCs to larger machines.The design process has recently been made significantly more user friendly by adding input programs written in Turbo Pascal, which allows a flexible implementation of computer graphics. The input programs have not only menu driven input and modification of numerical data, but also graphics editing of the data. The input programs create files which are subsequently read by the Fortran programs. From the main menu of our magnetic lens design program, further options are chosen by using function keys or numbers. Some options (lens initialization and setting, fine mesh, current densities, etc.) open other menus where computation parameters can be set or numerical data can be entered with the help of a simple line editor. The "draw lens" option enables graphical editing of the mesh - see fig. I. The geometry of the electron lens is specified in terms of coordinates and indices of a coarse quadrilateral mesh. In this mesh, the fine mesh with smoothly changing step size is calculated by an automeshing procedure. The options shown in fig. 1 allow modification of the number of coarse mesh lines, change of coordinates of mesh points or lines, and specification of lens parts. Interactive and graphical modification of the fine mesh can be called from the fine mesh menu. Finally, the lens computation can be called. Our FEM program allows up to 8000 mesh points on an AT computer. Another menu allows the display of computed results stored in output files and graphical display of axial flux density, flux density in magnetic parts, and the flux lines in magnetic lenses - see fig. 2. A series of several lens excitations with user specified or default magnetization curves can be calculated and displayed in one session.

McMillan electron lens in a system with space charge

2021 ◽  
Vol 16 (03) ◽  
pp. P03047
Author(s):  
S. Nagaitsev ◽  
I. Lobach ◽  
E. Stern ◽  
T. Zolkin
Keyword(s):  
Space Charge ◽  
Electron Lens

scholarly journals Polarization response of RHIC electron lens lattices

2016 ◽  
Vol 19 (10) ◽  
Author(s):  
V. H. Ranjbar ◽  
F. Méot ◽  
M. Bai ◽  
D. T. Abell ◽  
D. Meiser
Keyword(s):  
Polarization Response ◽  
Electron Lens

An on-chip electron lens

Science ◽  
2019 ◽  
Vol 364 (6435) ◽  
pp. 39.2-39
Author(s):  
Ian S. Osborne
Keyword(s):  
Electron Lens ◽  
On Chip

Fabrication of a miniaturized electron lens system and laser micro-machining condition for silicon membrane

2003 ◽  
Vol 69 (1) ◽  
pp. 57-64 ◽  
Author(s):  
Seungjoon Ahn ◽  
Dae-Wook Kim ◽  
Ho Seob Kim ◽  
Seong Joon Ahn ◽  
Jaewon Cho
Keyword(s):  
Micro Machining ◽  
Lens System ◽  
Silicon Membrane ◽  
Laser Micro Machining ◽  
Electron Lens
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