scholarly journals Electron beam and RF characterization of a high-brightness X-band photoinjector

2002 ◽  
Author(s):  
D.J. Gibson ◽  
F.V. Hartemann ◽  
E.C. Landahl ◽  
H.A. Baldis ◽  
C.H. Ho ◽  
...  
Keyword(s):  
Electron Beam ◽  
High Brightness ◽  
X Band

A very rapid in situ Kikuchi technique to determine relative crystal misorientation

1988 ◽  
Vol 46 ◽  
pp. 830-831
Author(s):  
J. I. Bennetch
Keyword(s):  
Electron Beam ◽  
Analytical Techniques ◽  
Superplastic Forming ◽  
The Other ◽  
Kikuchi Pattern ◽  
Kikuchi Line ◽  
Line Analysis

In a recent study of the superplastic forming (SPF) behavior of certain Al-Li-X alloys, the relative misorientation between adjacent (sub)grains proved to be an important parameter. It is well established that the most accurate way to determine misorientation across boundaries is by Kikuchi line analysis. However, the SPF study required the characterization of a large number of (sub)grains in each sample to be statistically meaningful, a very time-consuming task even for comparatively rapid Kikuchi analytical techniques.In order to circumvent this problem, an alternate, even more rapid in-situ Kikuchi technique was devised, eliminating the need for the developing of negatives and any subsequent measurements on photographic plates. All that is required is a double tilt low backlash goniometer capable of tilting ± 45° in one axis and ± 30° in the other axis. The procedure is as follows. While viewing the microscope screen, one merely tilts the specimen until a standard recognizable reference Kikuchi pattern is centered, making sure, at the same time, that the focused electron beam remains on the (sub)grain in question.

Performance and applications of the holography electron microscope

1993 ◽  
Vol 51 ◽  
pp. 1078-1079
Author(s):  
Akira Tonomura
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Phase Measurement ◽  
Electron Holography ◽  
Imaging Method ◽  
High Contrast ◽  
Magnetic Lens ◽  
High Brightness ◽  
Holographic Imaging ◽  
Dynamic Observation

Electron holography is a two-step imaging method. However, the ultimate performance of holographic imaging is mainly determined by the brightness of the electron beam used in the hologram-formation process. In our 350kV holography electron microscope (see Fig. 1), the decrease in the inherently high brightness of field-emitted electrons is minimized by superposing a magnetic lens in the gun, for a resulting value of 2 × 109 A/cm2 sr. This high brightness has lead to the following distinguished features. The minimum spacing (d) of carrier fringes is d = 0.09 Å, thus allowing a reconstructed image with a resolution, at least in principle, as high as 3d=0.3 Å. The precision in phase measurement can be as high as 2π/100, since the position of fringes can be known precisely from a high-contrast hologram formed under highly collimated illumination. Dynamic observation becomes possible because the current density is high.

Point-Cathode Electron Gun Using Electron-Beam Bombardment for Cathode Tip Heating

1990 ◽  
Vol 48 (1) ◽  
pp. 198-199
Author(s):  
Ryo Iiyoshi ◽  
Susumu Maruse ◽  
Hideo Takematsu
Keyword(s):  
Electron Beam ◽  
Tungsten Wire ◽  
Local Heating ◽  
Electron Gun ◽  
Original Position ◽  
Beam Power ◽  
Radius Of Curvature ◽  
High Brightness ◽  
Beam Focusing ◽  
Time Operation

Point cathode electron gun with high brightness and long cathode life has been developed. In this gun, a straightened tungsten wire is used as the point cathode, and the tip is locally heated to higher temperatures by electron beam bombardment. The high brightness operation and some findings on the local heating are presented.Gun construction is shown in Fig.l. Small heater assembly (annular electron gun: 5 keV, 1 mA) is set inside the Wehnelt electrode. The heater provides a disk-shaped bombarding electron beam focusing onto the cathode tip. The cathode is the tungsten wire of 0.1 mm in diameter. The tip temperature is raised to the melting point (3,650 K) at the beam power of 5 W, without any serious problem of secondary electrons for the gun operation. Figure 2 shows the cathode after a long time operation at high temperatures, or high brightnesses. Evaporation occurs at the tip, and the tip part retains a conical shape. The cathode can be used for a long period of time. The tip apex keeps the radius of curvature of 0.4 μm at 3,000 K and 0.3 μm at 3,200 K. The gun provides the stable beam up to the brightness of 6.4×106 A/cm2sr (3,150 K) at the accelerating voltage of 50 kV. At 3.4×l06 A/cm2sr (3,040 K), the tip recedes at a slow rate (26 μm/h), so that the effect can be offset by adjusting the Wehnelt bias voltage. The tip temperature is decreased as the tip moves out from the original position, but it can be kept at constant by increasing the bombarding beam power. This way of operation is possible for 10 h. A stepwise movement of the cathode is enough for the subsequent operation. Higher brightness operations with the rapid receding rates of the tip may be improved by a continuous movement of the wire cathode during the operations. Figure 3 shows the relation between the beam brightness, the tip receding rate by evaporation (αis the half-angle of the tip cone), and the cathode life per unit length, as a function of the cathode temperature. The working life of the point cathode is greatly improved by the local heating.

Characterization of AA7075/AA5356 gradient transition zone in an electron beam wire-feed additive manufactured sample

2021 ◽  
Vol 172 ◽  
pp. 110867
Author(s):  
V. Utyaganova ◽  
A. Filippov ◽  
S. Tarasov ◽  
N. Shamarin ◽  
D. Gurianov ◽  
...  
Keyword(s):  
Electron Beam ◽  
Transition Zone ◽  
Feed Additive ◽  
Wire Feed

scholarly journals Optical characterization of photosensitive AMTIR-1 chalcogenide thin layers deposited by electron beam deposition

2016 ◽  
Vol 442 ◽  
pp. 22-28 ◽  
Author(s):  
Alexandre Joërg ◽  
Fabien Lemarchand ◽  
Mengxue Zhang ◽  
Michel Lequime ◽  
Julien Lumeau
Keyword(s):  
Electron Beam ◽  
Optical Characterization ◽  
Thin Layers ◽  
Electron Beam Deposition ◽  
Beam Deposition
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