scholarly journals Design and testing of a high power, ultra-high vacuum, dual-directional coupler for the Advanced Photon Source (APS) linear accelerator

2002 ◽  
Author(s):  
S.O. Brauer ◽  
A.E. Grelick ◽  
J. Grimmer ◽  
R.D. Otocki ◽  
Y.W. Kang ◽  
...  
Keyword(s):  
High Power ◽  
Linear Accelerator ◽  
Directional Coupler ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Design And Testing ◽  
Photon Source

scholarly journals Development of a high-power and ultra-high-vacuum waveguide coupler working at C/X band

2015 ◽  
Vol 39 (5) ◽  
pp. 057007
Author(s):  
Xiang He ◽  
Feng-Li Zhao ◽  
Xiang-Jian Wang
Keyword(s):  
High Power ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Waveguide Coupler ◽  
X Band

scholarly journals Stable High Power deep-UV Enhancement Cavity in Ultra High Vacuum with Fluoride Coatings

2021 ◽  
Author(s):  
Paolo Crivelli ◽  
Zakary Burkley ◽  
Lucas de Sousa Borges ◽  
Ben Ohayon ◽  
Artem Golovizin ◽  
...  
Keyword(s):  
High Power ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Deep Uv

scholarly journals A fiber-based beam profiler for high-power laser beams in confined spaces and ultra-high vacuum

2020 ◽  
Vol 28 (5) ◽  
pp. 6164 ◽  
Author(s):  
Christian Brand ◽  
Ksenija Simonović ◽  
Filip Kiałka ◽  
Stephan Troyer ◽  
Philipp Geyer ◽  
...  
Keyword(s):  
High Power ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Laser Beams ◽  
High Power Laser ◽  
Power Laser ◽  
Confined Spaces

Study of the ultra-high-vacuum system of the 14-m-long vacuum chamber of the Taiwan Photon Source using the pressure build-up method

Vacuum ◽  
2014 ◽  
Vol 109 ◽  
pp. 368-372 ◽  
Author(s):  
L.H. Wu ◽  
T.Y. Lee ◽  
G.Y. Hsiung ◽  
Y.C. Yang ◽  
Z.W. Chen ◽  
...  
Keyword(s):  
Vacuum Chamber ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Vacuum System ◽  
Photon Source

Thin Pyrolytic Graphite Films for Electron Microscope Substrates

1971 ◽  
Vol 29 ◽  
pp. 226-227 ◽  
Author(s):  
George H. N. Riddle ◽  
Benjamin M. Siegel
Keyword(s):  
Vacuum Chamber ◽  
Pyrolytic Graphite ◽  
High Vacuum ◽  
Dark Field ◽  
Ultra High Vacuum ◽  
Graphite Substrate ◽  
Nickel Substrate ◽  
Routine Procedure ◽  
Field Electron Microscopy ◽  
Dark Field Electron

A routine procedure for growing very thin graphite substrate films has been developed. The films are grown pyrolytically in an ultra-high vacuum chamber by exposing (111) epitaxial nickel films to carbon monoxide gas. The nickel serves as a catalyst for the disproportionation of CO through the reaction 2C0 → C + CO2. The nickel catalyst is prepared by evaporation onto artificial mica at 400°C and annealing for 1/2 hour at 600°C in vacuum. Exposure of the annealed nickel to 1 torr CO for 3 hours at 500°C results in the growth of very thin continuous graphite films. The graphite is stripped from its nickel substrate in acid and mounted on holey formvar support films for use as specimen substrates.The graphite films, self-supporting over formvar holes up to five microns in diameter, have been studied by bright and dark field electron microscopy, by electron diffraction, and have been shadowed to reveal their topography and thickness. The films consist of individual crystallites typically a micron across with their basal planes parallel to the surface but oriented in different, apparently random directions about the normal to the basal plane.

A High Voltage Electron Microscopy Study of Sub-Oxide Formation in Vanadium

1971 ◽  
Vol 29 ◽  
pp. 212-213
Author(s):  
R. H. Geiss ◽  
R. L. Ladd ◽  
K. R. Lawless
Keyword(s):  
High Vacuum ◽  
Microscopy Study ◽  
Electron Microscopy Study ◽  
Ultra High Vacuum ◽  
Pure Oxygen ◽  
Pressure Oxidation ◽  
High Voltage Electron Microscopy ◽  
Oxidation Study ◽  
Voltage Electron ◽  
Good Agreement

Detailed electron microscope and diffraction studies of the sub-oxides of vanadium have been reported by Cambini and co-workers, and an oxidation study, possibly complicated by carbon and/or nitrogen, has been published by Edington and Smallman. The results reported by these different authors are not in good agreement. For this study, high purity polycrystalline vanadium samples were electrochemically thinned in a dual jet polisher using a solution of 20% H2SO4, 80% CH3OH, and then oxidized in an ion-pumped ultra-high vacuum reactor system using spectroscopically pure oxygen. Samples were oxidized at 350°C and 100μ oxygen pressure for periods of 30,60,90 and 160 minutes. Since our primary interest is in the mechanism of the low pressure oxidation process, the oxidized samples were cooled rapidly and not homogenized. The specimens were then examined in the HVEM at voltages up to 500 kV, the higher voltages being necessary to examine thick sections for which the oxidation behavior was more characteristic of the bulk.

The High Resolution Scanning Transmission Electron Microscope

1974 ◽  
Vol 32 ◽  
pp. 316-317
Author(s):  
A. V. Crewe
Keyword(s):  
Electron Microscope ◽  
High Resolution ◽  
High Vacuum ◽  
Scanning Transmission Electron Microscope ◽  
Ultra High Vacuum ◽  
Resolving Power ◽  
Imaging Characteristics ◽  
Transmission Electron ◽  
Scanning Transmission ◽  
The Moment

The high resolution STEM is now a fact of life. I think that we have, in the last few years, demonstrated that this instrument is capable of the same resolving power as a CEM but is sufficiently different in its imaging characteristics to offer some real advantages.It seems possible to prove in a quite general way that only a field emission source can give adequate intensity for the highest resolution^ and at the moment this means operating at ultra high vacuum levels. Our experience, however, is that neither the source nor the vacuum are difficult to manage and indeed are simpler than many other systems and substantially trouble-free.

Structure of Palladium Single-Crystal Films Prepared by Flash Evaporation onto (001) NaCl Substrates

1970 ◽  
Vol 28 ◽  
pp. 456-457
Author(s):  
L. E. Murr ◽  
G. Wong
Keyword(s):  
Single Crystal ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
High Rate ◽  
Flash Evaporation ◽  
Optimum Load ◽  
Single Crystal Films ◽  
Crystal Films ◽  
A Current

Palladium single-crystal films have been prepared by Matthews in ultra-high vacuum by evaporation onto (001) NaCl substrates cleaved in-situ, and maintained at ∼ 350° C. Murr has also produced large-grained and single-crystal Pd films by high-rate evaporation onto (001) NaCl air-cleaved substrates at 350°C. In the present work, very large (∼ 3cm2), continuous single-crystal films of Pd have been prepared by flash evaporation onto air-cleaved (001) NaCl substrates at temperatures at or below 250°C. Evaporation rates estimated to be ≧ 2000 Å/sec, were obtained by effectively short-circuiting 1 mil tungsten evaporation boats in a self-regulating system which maintained an optimum load current of approximately 90 amperes; corresponding to a current density through the boat of ∼ 4 × 104 amperes/cm2.

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