Fabrication and application of soft glass micro-optical elements for midIR fiber optics

2014 ◽  
Author(s):  
R. Kasztelanic ◽  
I. Kujawa ◽  
R. Stepien ◽  
R. Buczynski
Keyword(s):  
Fiber Optics ◽  
Optical Elements ◽  
Soft Glass

scholarly journals Stack and draw fabrication of soft glass microstructured fiber optics

2014 ◽  
Vol 62 (4) ◽  
pp. 667-682 ◽  
Author(s):  
D. Pysz ◽  
I. Kujawa ◽  
R. Stępień ◽  
M. Klimczak ◽  
A. Filipkowski ◽  
...  
Keyword(s):  
Photonic Crystal ◽  
Fiber Optics ◽  
Electronic Materials ◽  
Photonic Crystal Fibers ◽  
Microstructured Fiber ◽  
Microstructured Fibers ◽  
Soft Glass ◽  
Highly Nonlinear ◽  
Crystal Fibers ◽  
Light Guides

Abstract A broad review is given of microstructured fiber optics components - light guides, image guides, multicapillary arrays, and photonic crystal fibers - fabricated using the stack-and-draw method from various in-house synthesized oxide soft glasses at the Glass Department of the Institute of Electronic Materials Technology (ITME). The discussion covers fundamental aspects of stack-and-draw technology used at ITME, through design methods, soft glass material issues and parameters, to demonstration of representative examples of fabricated structures and an experimental characterization of their optical properties and results obtained in typical applications. Specifically, demonstrators include microstructured image guides providing resolution of up to 16000 pixels sized up to 20 μm in diameter, and various photonic crystal fibers (PCFs): index-guiding regular lattice air-hole PCFs, hollow core photonic bandgap PCFs, or specialty PCFs like highly birefringent microstructured fibers or highly nonlinear fibers for supercontinuum generation. The presented content is put into context of previous work in the area reported by the group of authors, as well as other research teams.

Near-field scanning optical microscopy

1986 ◽  
Vol 44 ◽  
pp. 642-643
Author(s):  
E. Betzig ◽  
A. Harootunian ◽  
M. Isaacson ◽  
A. Lewis
Keyword(s):  
Near Field ◽  
Optical Microscope ◽  
Visible Radiation ◽  
Field Methods ◽  
Optical Elements ◽  
Optical Region ◽  
Order Of Magnitude ◽  
Nondestructive Imaging ◽  
Scanning Optical Microscopy ◽  
Near Field Scanning

In general, conventional methods of optical imaging are limited in spatial resolution by either the wavelength of the radiation used or by the aberrations of the optical elements. This is true whether one uses a scanning probe or a fixed beam method. The reason for the wavelength limit of resolution is due to the far field methods of producing or detecting the radiation. If one resorts to restricting our probes to the near field optical region, then the possibility exists of obtaining spatial resolutions more than an order of magnitude smaller than the optical wavelength of the radiation used. In this paper, we will describe the principles underlying such "near field" imaging and present some preliminary results from a near field scanning optical microscope (NS0M) that uses visible radiation and is capable of resolutions comparable to an SEM. The advantage of such a technique is the possibility of completely nondestructive imaging in air at spatial resolutions of about 50nm.

Designing high-resolution slow scan CCD-based TEM camera systems

1992 ◽  
Vol 50 (2) ◽  
pp. 946-947
Author(s):  
James F. Mancuso ◽  
William B. Maxwell ◽  
Russell E. Camp ◽  
Mark H. Ellisman
Keyword(s):  
Fiber Optics ◽  
Ccd Camera ◽  
High Energy ◽  
Phosphor Layer ◽  
X Ray ◽  
Light Production ◽  
Camera Systems ◽  
X Ray Imaging ◽  
Electron Image ◽  
Scintillating Fiber

The imaging requirements for 1000 line CCD camera systems include resolution, sensitivity, and field of view. In electronic camera systems these characteristics are determined primarily by the performance of the electro-optic interface. This component converts the electron image into a light image which is ultimately received by a camera sensor.Light production in the interface occurs when high energy electrons strike a phosphor or scintillator. Resolution is limited by electron scattering and absorption. For a constant resolution, more energy deposition occurs in denser phosphors (Figure 1). In this respect, high density x-ray phosphors such as Gd2O2S are better than ZnS based cathode ray tube phosphors. Scintillating fiber optics can be used instead of a discrete phosphor layer. The resolution of scintillating fiber optics that are used in x-ray imaging exceed 20 1p/mm and can be made very large. An example of a digital TEM image using a scintillating fiber optic plate is shown in Figure 2.

Characterization of Rh/Si multilayer structure by HREM and HAADF

1992 ◽  
Vol 50 (1) ◽  
pp. 122-123
Author(s):  
Y. Cheng ◽  
J. Liu ◽  
M.B. Stearns ◽  
D.G. Steams
Keyword(s):  
Normal Incidence ◽  
High Resolution Electron Microscopy ◽  
X Rays ◽  
Beam Direction ◽  
Cross Sectional ◽  
Optical Elements ◽  
Resolution Electron ◽  
Point To Point ◽  
Better Than

The Rh/Si multilayer (ML) thin films are promising optical elements for soft x-rays since they have a calculated normal incidence reflectivity of ∼60% at a x-ray wavelength of ∼13 nm. However, a reflectivity of only 28% has been attained to date for ML fabricated by dc magnetron sputtering. In order to determine the cause of this degraded reflectivity the microstructure of this ML was examined on cross-sectional specimens with two high-resolution electron microscopy (HREM and HAADF) techniques.Cross-sectional specimens were made from an as-prepared ML sample and from the same ML annealed at 298 °C for 1 and 100 hours. The specimens were imaged using a JEM-4000EX TEM operating at 400 kV with a point-to-point resolution of better than 0.17 nm. The specimens were viewed along Si [110] projection of the substrate, with the (001) Si surface plane parallel to the beam direction.

Embedded training in the FOG-M (fiber optics guided missile)

1984 ◽  
Author(s):  
Dorothy L. Finley ◽  
Irving N. Alderman ◽  
M. Sue Bogner ◽  
Nancy B. Mitchell
Keyword(s):  
Fiber Optics
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