Multilevel Resistive-Change Memory Operation of Al-Doped ZnO Thin-Film Transistor

2016 ◽  
Vol 37 (8) ◽  
pp. 1014-1017 ◽  
Author(s):  
Won-Ho Lee ◽  
Eom-Ji Kim ◽  
Sung-Min Yoon
2008 ◽  
Vol 93 (8) ◽  
pp. 083508 ◽  
Author(s):  
Won Jun Park ◽  
Hyun Soo Shin ◽  
Byung Du Ahn ◽  
Gun Hee Kim ◽  
Seung Min Lee ◽  
...  

2014 ◽  
Vol 305 ◽  
pp. 474-476 ◽  
Author(s):  
D.Z. Zhou ◽  
B. Li ◽  
H.L. Wang ◽  
M. Salik ◽  
H.H. Wu ◽  
...  

2013 ◽  
Vol 667 ◽  
pp. 511-515 ◽  
Author(s):  
N.D. Md Sin ◽  
Mohamad Hafiz Mamat ◽  
Mohamad Rusop

The properties of nanostructured aluminum (Al) doped zinc oxide (ZnO) thin film for thin film transistors (TFT) are presented. This research has been focused on optical and structural properties of Al doped ZnO thin film. The influence of Al doping concentration at 0~5 at.% on the Al doped ZnO thin film properties have been investigated. The thin films were characterized using UV-Vis-NIR spectrophotometer for optical properties. The surface morphology has been characterized using field emission scanning electron microscope (FESEM). The absorption coefficient spectra obtained from UV-Vis-NIR spectrophotometer measurement show all films have low absorbance in visible and near infrared (IR) region but have high UV absorption properties. The calculated Urbach energy indicated the defects concentrations in the thin films increase with doping concentrations The FESEM investigations shows that the nanoparticles size becomes smaller and denser as the doping concentration increase.


2020 ◽  
Vol 31 (9) ◽  
pp. 6948-6955
Author(s):  
Mustafa Özgür ◽  
Suat Pat ◽  
Reza Mohammadigharehbagh ◽  
Uğur Demirkol ◽  
Nihan Akkurt ◽  
...  

2020 ◽  
Vol 217 (24) ◽  
pp. 2000537
Author(s):  
Shailendra Kr. Singh ◽  
Uttam Kr. Samanta ◽  
Anirban Dhar ◽  
Mrinmay Pal ◽  
Mukul Chandra Paul

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