Medium energy ion scattering analysis of damage in silicon caused by ultra-low energy boron implantation at different substrate temperatures
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1989 ◽
Vol 36
(4)
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pp. 446-454
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2002 ◽
Vol 14
(4)
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pp. 665-673
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2006 ◽
Vol 242
(1-2)
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pp. 591-594
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1995 ◽
Vol 99
(1-4)
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pp. 495-498
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