Dual-channel technology with cap-free single metal gate for high performance CMOS in gate-first and gate-last integration

2011 ◽  
Author(s):  
L. Witters ◽  
J. Mitard ◽  
A. Veloso ◽  
A. Hikavyy ◽  
J. Franco ◽  
...  
Keyword(s):  
High Performance ◽  
Metal Gate ◽  
Dual Channel

32nm gate-first high-k/metal-gate technology for high performance low power applications

2008 ◽  
Author(s):  
C. H. Diaz ◽  
K. Goto ◽  
H.T. Huang ◽  
Yuri Yasuda ◽  
C.P. Tsao ◽  
...  
Keyword(s):  
Low Power ◽  
High Performance ◽  
Metal Gate ◽  
High K

High Performance Metal Gate CMOSFETs with Aggressively Scaled Hf-Based High-k

2019 ◽  
Vol 1 (5) ◽  
pp. 609-623 ◽  
Author(s):  
Seung-Chul Song ◽  
G. L. Zhang ◽  
S. H. Bae ◽  
P. Kirsch ◽  
P. Majhi ◽  
...  
Keyword(s):  
High Performance ◽  
Metal Gate ◽  
High K

High performance FDSOI CMOS technology with metal gate and high-k

2005 ◽  
Author(s):  
B. Doris ◽  
Y.H. Kim ◽  
B.P. Linder ◽  
M. Steen ◽  
V. Narayanan ◽  
...  
Keyword(s):  
High Performance ◽  
Cmos Technology ◽  
Metal Gate ◽  
High K

scholarly journals High Performance Metal-Gate/High- ${\kappa } $ GaN MOSFET With Good Reliability for Both Logic and Power Applications

2016 ◽  
Vol 4 (5) ◽  
pp. 246-252 ◽  
Author(s):  
Shih-Han Yi ◽  
Dun-Bao Ruan ◽  
Shaoyan Di ◽  
Xiaoyan Liu ◽  
Yung Hsien Wu ◽  
...  
Keyword(s):  
High Performance ◽  
Metal Gate ◽  
Good Reliability
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