Advanced Ni-based FUlly SIlicidation (FUSI) technology for sub-45nm CMOS devices

2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings ◽

10.1109/icsict.2006.306263 ◽

2006 ◽

Author(s):

H.Y. Yu ◽

M.F. Li ◽

A. Lauwers ◽

J.A. Kittl ◽

R. Singanamalla ◽

...

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