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Defect passivation and interface engineering for high-K gate dielectric device performance and reliability enhancement
2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings
◽
10.1109/icsict.2006.306253
◽
2006
◽
Author(s):
Hsing-huang Tseng
Keyword(s):
Gate Dielectric
◽
Device Performance
◽
Interface Engineering
◽
High K
◽
Defect Passivation
◽
Reliability Enhancement
◽
High K Gate Dielectric
Download Full-text
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References
Interface Engineering for High-K Gate Dielectric Device Performance and Reliability Enhancement
ECS Meeting Abstracts
◽
10.1149/ma2005-02/13/546
◽
2005
◽
Keyword(s):
Gate Dielectric
◽
Device Performance
◽
Interface Engineering
◽
High K
◽
Reliability Enhancement
◽
High K Gate Dielectric
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Interface Engineering for the Enhancement of Carrier Transport in Black Phosphorus Transistor with Ultra-Thin High-k Gate Dielectric
Scientific Reports
◽
10.1038/srep26609
◽
2016
◽
Vol 6
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◽
Cited By ~ 23
Author(s):
Zhi-Peng Ling
◽
Jun-Tao Zhu
◽
Xinke Liu
◽
Kah-Wee Ang
Keyword(s):
Carrier Transport
◽
Gate Dielectric
◽
Black Phosphorus
◽
Interface Engineering
◽
High K
◽
High K Gate Dielectric
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Epitaxial lanthanide oxide thin films on Si for high-k gate dielectric application: Growth optimization and defect passivation
Journal of Materials Research
◽
10.1557/jmr.2017.22
◽
2017
◽
Vol 32
(4)
◽
pp. 699-716
◽
Cited By ~ 4
Author(s):
Ayan Roy Chaudhuri
◽
Andrea Fissel
◽
Hans Jörg Osten
Keyword(s):
Thin Films
◽
Gate Dielectric
◽
Oxide Thin Films
◽
Lanthanide Oxide
◽
Growth Optimization
◽
High K
◽
Defect Passivation
◽
Image Position
◽
High K Gate Dielectric
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The impact of high-k gate dielectric on Junctionless Vertical Double Gate MOSFET
International Journal of Computer Sciences and Engineering
◽
10.26438/ijcse/v6i6.14751478
◽
2018
◽
Vol 6
(6)
◽
pp. 1475-1478
Author(s):
Jagdeep Rahul
Keyword(s):
Gate Dielectric
◽
Double Gate
◽
High K
◽
Double Gate Mosfet
◽
The Impact
◽
High K Gate Dielectric
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Development of High-K Gate Dielectric Materials
Journal of Inorganic Materials
◽
10.3724/sp.j.1077.2008.00865
◽
2008
◽
Vol 23
(5)
◽
pp. 865-871
◽
Cited By ~ 2
Author(s):
De-Qi WU
Keyword(s):
Gate Dielectric
◽
Dielectric Materials
◽
High K
◽
High K Gate Dielectric
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Optimization of Device Dimensions of High-k Gate Dielectric Based DG-TFET for Improved Analog/RF Performance
Silicon
◽
10.1007/s12633-021-01127-y
◽
2021
◽
Author(s):
Shubham Tayal
◽
Goyal Vibhu
◽
Shweta Meena
◽
Ravi Gupta
Keyword(s):
Gate Dielectric
◽
High K
◽
Rf Performance
◽
High K Gate Dielectric
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Lanthanum Doped Zirconium Oxide (LaZrO2) High-k Gate Dielectric FinFET SRAM Cell Optimization
Transactions on Electrical and Electronic Materials
◽
10.1007/s42341-021-00296-2
◽
2021
◽
Author(s):
Gurpurneet Kaur
◽
Sandeep Singh Gill
◽
Munish Rattan
Keyword(s):
Zirconium Oxide
◽
Gate Dielectric
◽
High K
◽
Sram Cell
◽
High K Gate Dielectric
Download Full-text
Polarity dependent reliability of advanced MOSFET using MOCVD nitrided Hf-silicate high-k gate dielectric
IEEE International Integrated Reliability Workshop Final Report 2002 IRWS-02
◽
10.1109/irws.2002.1194241
◽
2003
◽
Cited By ~ 2
Author(s):
J. Zhang
◽
E. Zhao
◽
Q. Xiang
◽
J. Chan
◽
J. Jeon
◽
...
Keyword(s):
Gate Dielectric
◽
High K
◽
High K Gate Dielectric
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Experimental observations of the thermal stability of high-k gate dielectric materials on silicon
Journal of Non-Crystalline Solids
◽
10.1016/s0022-3093(02)00964-x
◽
2002
◽
Vol 303
(1)
◽
pp. 54-63
◽
Cited By ~ 54
Author(s):
P.S. Lysaght
◽
P.J. Chen
◽
R. Bergmann
◽
T. Messina
◽
R.W. Murto
◽
...
Keyword(s):
Thermal Stability
◽
Gate Dielectric
◽
Dielectric Materials
◽
High K
◽
Thermal Stability Of
◽
High K Gate Dielectric
Download Full-text
Impact of nitrogen concentration on the performance of LaAlO3(1−y/2)Ny films for high-k gate dielectric applications
Journal of Physics D Applied Physics
◽
10.1088/0022-3727/38/3/013
◽
2005
◽
Vol 38
(3)
◽
pp. 442-445
◽
Cited By ~ 6
Author(s):
G H Shi
◽
X B Lu
◽
X K Kong
◽
Z G Liu
Keyword(s):
Gate Dielectric
◽
Nitrogen Concentration
◽
High K
◽
High K Gate Dielectric
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