Post-Layout Perturbation towards Stitch Friendly Layout for Multiple E-Beam Lithography

2017 IEEE International Conference on Computer Design (ICCD) ◽

10.1109/iccd.2017.71 ◽

2017 ◽

Cited By ~ 1

Author(s):

Sudipta Paul ◽

Pritha Banerjee ◽

Susmita Sur-Kolay

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