Cross-wafer controlled interface layer thickness variation, and its application to SiO2 / high-κ stack characterisation
2020 ◽
Vol 495
◽
pp. 165858
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Keyword(s):
Keyword(s):
2001 ◽
Vol 34
(14)
◽
pp. 2085-2088
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1994 ◽
Vol 29
(7)
◽
pp. 1773-1780
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2017 ◽
Vol 53
(6)
◽
pp. 4001-4009
◽
2016 ◽
Keyword(s):
2020 ◽
Vol 6
(3)
◽
pp. 410-412
Keyword(s):