Performance modeling and broadband characterization of chip-to-chip interconnects with rough surfaces

2016 ◽  
Author(s):  
Somesh Kumar ◽  
Rohit Sharma
Keyword(s):  
Performance Modeling ◽  
Rough Surfaces

Mathematical Modeling of Flattening Process on Rough Surfaces in Thermal Spray

1996 ◽  
Author(s):  
H. Fukanuma
Keyword(s):  
Mathematical Modeling ◽  
Surface Roughness ◽  
Thermal Spray ◽  
Rough Surfaces ◽  
Time Decrease ◽  
Flattening Process

Abstract Thermal spray layers are formed on rough surfaces; however, the flattening process on rough surfaces has not yet been clarified. A mathematical flattening model which takes into account the roughness of the substrate or previously coated layers is proposed in this paper. As a result of surface roughness, the flattening degree and the flattening time decrease with increasing surface roughness in this model. In addition, the characterization of surface roughness is introduced for the flattening model. Several calculated cases of the flattening model are shown.

The fractal characterization of rough surfaces

1992 ◽  
Vol T44 ◽  
pp. 9-14 ◽  
Author(s):  
T Jøssang ◽  
J Feder
Keyword(s):  
Rough Surfaces

scholarly journals Systematic performance modeling and characterization of heterogeneous IP networks

2006 ◽  
Vol 72 (7) ◽  
pp. 1134-1143 ◽  
Author(s):  
Alessio Botta ◽  
Donato Emma ◽  
Antonio Pescapé ◽  
Giorgio Ventre
Keyword(s):  
Performance Modeling ◽  
Ip Networks

Novel Noncontact Thickness Metrology for Partially Transparent and Nontransparent Wafers for Backend Semiconductor Manufacturing

2004 ◽  
Vol 829 ◽  
Author(s):  
Wojciech J. Walecki ◽  
Vitali Souchkov ◽  
Kevin Lai ◽  
Phuc Van ◽  
Manuel Santos ◽  
...  
Keyword(s):  
Semiconductor Manufacturing ◽  
Rough Surfaces ◽  
Optical Interferometry ◽  
Smooth Surfaces ◽  
Low Coherence ◽  
Low Coherence Interferometry ◽  
Single Probe ◽  
Thin Semiconductor ◽  
Compound Materials

ABSTRACTSingle probe infrared low coherence optical interferometry has been proven to be an effective tool for characterization of thin and ultra-thin semiconductor Si and compound materials wafers. Its application was however limited to wafers transparent at probing wavelength, and having relatively smooth surfaces. Purpose of this paper is to present an extension of low coherence interferometry to characterization of non-transparent wafers, and wafers with rough surfaces.

Fractal characterization of rough surfaces using secondary electrons

1987 ◽  
Vol 55 (3) ◽  
pp. 99-104 ◽  
Author(s):  
C. S. Pande ◽  
N. Louat ◽  
R. A. Masumura ◽  
S. Smith
Keyword(s):  
Rough Surfaces ◽  
Secondary Electrons

An approximation to the dynamical calculation of rheed patterns from rough surfaces

1996 ◽  
Vol 54 ◽  
pp. 596-597
Author(s):  
S. Lordi ◽  
J.A Eades
Keyword(s):  
Molecular Beam ◽  
Rough Surfaces ◽  
High Energy ◽  
High Energy Electron ◽  
Statistical Parameters ◽  
Flat Surfaces ◽  
Dynamical Calculation ◽  
Computationally Intensive ◽  
Growth Methods

RHEED (reflection high energy electron diffraction) is a technique widely used in molecular beam epitaxy (MBE) and for the characterization of surfaces in other contexts. Despite its widespread use, however, the interpretation of RHEED has largely been limited to the use of positions of the reflections with no attempt made to use the intensities in the patterns.The reasons for this are related to the complexity of RHEED computations. There are several methods which can be used to calculate RHEED intensities from flat surfaces. However, in MBE (and other crystal growth methods) where RHEED is most often used, the surfaces are rough. Of the dynamical methods for calculating RHEED intensities from flat surfaces, only the modified Cowley-Moodie multislice method with the edge patching algorithm can be applied to rough surfaces without making severe approximations. This method is computationally intensive because the ensemble average over the statistical parameters of the surface cannot be done before the dynamical calculations.

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