Annealing experiments on InP/InGaAs single and double HBTs grown by molecular beam epitaxy

2003 ◽  
Author(s):  
J. Sexton ◽  
M. Missous
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Annealing Experiments

Formation and Structure of Thin Mo Layers and Mo-Ni Multilayers on Ni(001) by Molecular Beam Epitaxy

1989 ◽  
Vol 160 ◽  
Author(s):  
Y.H. Lee ◽  
R.P. Burns ◽  
J.B. Posthill ◽  
K.J. Bachmann
Keyword(s):  
Thin Films ◽  
High Temperature ◽  
High Resolution ◽  
Molecular Beam Epitaxy ◽  
Low Temperature ◽  
Molecular Beam ◽  
Nucleation And Growth ◽  
Multilayer Heterostructures ◽  
Annealing Experiments ◽  
Small Period

AbstractThe growth of Mo overtayers and Mo-Ni multilayers on single crystal Ni(001) substrates is described. The nucleation and growth processes of these thin films were analyzed by LEED, XPS, AES and SEM and High Resolution AES investigations without breaking vacuum. Growth of Mo-Ni multilayer heterostructures on Ni(001) with ≈20Å periodicity is possible at low temperature (≈200 °C). At high temperature (≈550 °C) the growth proceeds by the Volmer-Weber mechanism preventing the deposition of small period multilayers. Annealing experiments on ultra-thin (<20Å) Mo overiayers deposited at 200 °C show an onset of interdiffusion at ≈ 550°C coupled to the generation of a new surface periodicity.

Shape and Size Distribution of Molecular Beam Epitaxy Grown Self-Assembled Ge Islands on Si (001) Substrates

2008 ◽  
Vol 8 (8) ◽  
pp. 4101-4105
Author(s):  
R. K. Singha ◽  
S. Das ◽  
K. Das ◽  
S. Majumdar ◽  
A. Dhar ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Size Distribution ◽  
Molecular Beam ◽  
Alloy Composition ◽  
Strain Relaxation ◽  
X Ray ◽  
Compositional Changes ◽  
Annealing Experiments ◽  
Shape And Size ◽  
Good Agreement

We have performed a series of annealing experiments with Ge islands on Si (001) grown by molecular beam epitaxy, in order to clarify issues related to island stability and coarsening. The shape and size distribution of nanoislands as a function of annealing time at a temperature of 650 °C have been studied. Optical phonons from Raman spectra have been used as efficient probes to study the evolution of Si1−xGex islands. Both the alloy composition and residual strain in the islands have been determined from the phonon frequencies and Raman intensities. The experimental results are in good agreement with the strain relaxation estimated using X-ray rocking curves. The results indicate that the shape and size distribution of Ge islands are controlled via structural and compositional changes through strain relaxation by the periodic creation and extinction of tiny nanocrystals.

Epitaxial Growth of CoGa on (100)GaAs by Metal-Organic Molecular Beam Epitaxy

1998 ◽  
Vol 514 ◽  
Author(s):  
N. Viguier ◽  
F. Maury
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Lattice Mismatch ◽  
Pressure Ratio ◽  
Inert Atmosphere ◽  
Gaas Surface ◽  
Cubic Phase ◽  
Metal Organic ◽  
Simple Cube ◽  
Annealing Experiments

ABSTRACTEpitaxial layers of the intermetallic β-CoGa cubic phase were grown at low temperature on (100)GaAs by metal-organic molecular beam epitaxy (MOMBE) using GaEt3 and CpCo(CO)2 as vapor sources. The film composition and the lattice mismatch on (100)GaAs may be adjusted by controlling the molecular beam pressure ratio. The growth on a Co-saturated GaAs surface leads to the formation of bi-phased CoGa-CoAs films whereas epitaxial single-phased β-CoGa layers are grown on a Ga-terminated GaAs surface with the simple cube on cube orientation [100](001 )CoGa//[100](001)GaAs. Annealing experiments under inert atmosphere have shown that MOMBE CoGa films are thermally stable on GaAs until ca. 823 K. Ohmic and Schottky CoGa/GaAs contacts have been made depending on the doping of the substrate by this process.

Defects in Heavily-Doped MBE GaAs

1982 ◽  
Vol 40 ◽  
pp. 442-445
Author(s):  
C.B. Carter ◽  
D.M. DeSimone ◽  
T. Griem ◽  
C.E.C. Wood
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Heavily Doped

Molecular-beam epitaxy (MBE) is potentially an extremely valuable tool for growing III-V compounds. The value of the technique results partly from the ease with which controlled layers of precisely determined composition can be grown, and partly from the ability that it provides for growing accurately doped layers.

An in situ and ex situ TEM study of the formation of thin cobalt silicide films by molecular beam epitaxy on the silicon (100) surface

1988 ◽  
Vol 46 ◽  
pp. 884-885
Author(s):  
D. Loretto ◽  
J. M. Gibson ◽  
S. M. Yalisove ◽  
R. T. Tung
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Defect Density ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Ex Situ ◽  
Metal Base ◽  
In Situ Experiments ◽  
Potential Applications

The cobalt disilicide/silicon system has potential applications as a metal-base and as a permeable-base transistor. Although thin, low defect density, films of CoSi2 on Si(111) have been successfully grown, there are reasons to believe that Si(100)/CoSi2 may be better suited to the transmission of electrons at the silicon/silicide interface than Si(111)/CoSi2. A TEM study of the formation of CoSi2 on Si(100) is therefore being conducted. We have previously reported TEM observations on Si(111)/CoSi2 grown both in situ, in an ultra high vacuum (UHV) TEM and ex situ, in a conventional Molecular Beam Epitaxy system.The procedures used for the MBE growth have been described elsewhere. In situ experiments were performed in a JEOL 200CX electron microscope, extensively modified to give a vacuum of better than 10-9 T in the specimen region and the capacity to do in situ sample heating and deposition. Cobalt was deposited onto clean Si(100) samples by thermal evaporation from cobalt-coated Ta filaments.

Near-Surface Aggregation of Sn In Heavily Sn-Doped GaAs Films Grown By Molecular Beam Epitaxy

1985 ◽  
Vol 43 ◽  
pp. 368-369
Author(s):  
S. H. Chen
Keyword(s):  
Molecular Beam Epitaxy ◽  
Cross Section ◽  
Electron Spectroscopy ◽  
Molecular Beam ◽  
Surface Segregation ◽  
Secondary Ion Mass Spectrometry ◽  
Specimen Preparation ◽  
Near Surface ◽  
Gaas Films ◽  
Secondary Ion

Sn has been used extensively as an n-type dopant in GaAs grown by molecular-beam epitaxy (MBE). The surface accumulation of Sn during the growth of Sn-doped GaAs has been observed by several investigators. It is still not clear whether the accumulation of Sn is a kinetically hindered process, as proposed first by Wood and Joyce, or surface segregation due to thermodynamic factors. The proposed donor-incorporation mechanisms were based on experimental results from such techniques as secondary ion mass spectrometry, Auger electron spectroscopy, and C-V measurements. In the present study, electron microscopy was used in combination with cross-section specimen preparation. The information on the morphology and microstructure of the surface accumulation can be obtained in a fine scale and may confirm several suggestions from indirect experimental evidence in the previous studies.

The relaxation of compressive biaxial strains in SOS via microtwins

1989 ◽  
Vol 47 ◽  
pp. 608-609
Author(s):  
M. E. Twigg ◽  
E. D. Richmond ◽  
J. G. Pellegrino
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Molecular Beam Epitaxy ◽  
Compressive Stress ◽  
Vapor Deposition ◽  
Partial Dislocation ◽  
Molecular Beam ◽  
Volume Fraction ◽  
Chemical Vapor ◽  
Silicon Thin Film

For heteroepitaxial systems, such as silicon on sapphire (SOS), microtwins occur in significant numbers and are thought to contribute to strain relief in the silicon thin film. The size of this contribution can be assessed from TEM measurements, of the differential volume fraction of microtwins, dV/dν (the derivative of the microtwin volume V with respect to the film volume ν), for SOS grown by both chemical vapor deposition (CVD) and molecular beam epitaxy (MBE).In a (001) silicon thin film subjected to compressive stress along the [100] axis , this stress can be relieved by four twinning systems: a/6[211]/( lll), a/6(21l]/(l1l), a/6[21l] /( l1l), and a/6(2ll)/(1ll).3 For the a/6[211]/(1ll) system, the glide of a single a/6[2ll] twinning partial dislocation draws the two halves of the crystal, separated by the microtwin, closer together by a/3.

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