An effective solution to microwave arrays synthesis with null field constraints in the near-field region

2002 ◽  
Author(s):  
O.M. Bucci ◽  
C. Gennarelli ◽  
G. Riccio ◽  
G. Panariello ◽  
C. Savarese
Keyword(s):  
Near Field ◽  
Field Region ◽  
Effective Solution ◽  
Null Field

scholarly journals Experimental observation of asymmetrical microwave jets and far-field distribution generated by a dual-material system

2021 ◽  
Vol 11 (1) ◽  
Author(s):  
B. Varghese ◽  
O. Shramkova ◽  
P. Minard ◽  
L. Blondé ◽  
V. Drazic ◽  
...  
Keyword(s):  
Near Field ◽  
Microwave Frequency ◽  
Far Field ◽  
Material System ◽  
Field Region ◽  
Edge Diffraction ◽  
Jet Behavior ◽  
Electric Field Profile ◽  
Dual Material ◽  
Plane Wave Diffraction

AbstractIn this paper, we report the experimental and numerical investigation of plane wave diffraction by an all-dielectric dual-material cuboid. Edge diffraction by a cuboid leads to the generation of a narrow, high intensity beam in the near-field region called a photonic jet. We examine the dependence of the jet behavior and orientation on the materials and dimensions of constitutive parts in the microwave frequency domain. The possibility to shift and deviate the resultant microwave jet in the near-field region of such a structure depending on the size of constitutive parts is demonstrated numerically. Experimentally, we observe a shift in the spatial position of the jet. The experimental asymmetric electric field profile observed in the far-field region is attributed to the input of multiple edge waves generated by the dual-material cuboid. The presented results may be scaled at different frequency bands such as optical frequencies for designing nanostructures enabling the focusing and deviation functionality and creation of new optical devices which would satisfy the needs of emerging nanophotonic applications.

Method of Identifying Injector Coking From the Spray Field of Mechanical and CRDi Injectors Using Intensity of Scattered Light

2017 ◽  
Vol 140 (2) ◽  
Author(s):  
Ronith Stanly ◽  
Gopakumar Parameswaran ◽  
Bibin Sagaram
Keyword(s):  
Scattered Light ◽  
Near Field ◽  
Cone Angle ◽  
Angle Measurement ◽  
Field Region ◽  
Fuel System ◽  
Spray Cone Angle ◽  
Spray Cone ◽  
Cleaning Procedure ◽  
Spray Field

The influence of injector coking deposits on the spray field of single-hole mechanical port fuel injectors and multihole common rail direct injection (CRDi) injectors was studied using light scattering technique coupled with image processing and analysis. Instead of employing the traditional accelerated coking process to study injector spray field deterioration, in-service injectors were selected and cleaned using a commercial fuel system cleaning procedure. Variation in atomization characteristics of coked and cleaned injectors were observed based on the spatial distribution of fine, medium, and coarse droplets in the near-field region of the injector spray zone and analyzed as a function of the intensity of scattered light. The improvement in the atomization perceived by this method was compared with traditional techniques like spray cone angle measurement, speed characterization of spray jets, and weight reduction of injector nozzles and needles. It was observed that after the fuel system cleaning procedure, a reduction in the number of coarse droplets in the near-field region and an increase in the number of medium and finely sized droplets was observed, suggesting better atomization of fuel in the near field spray zone.

Enhanced Air-Gap Control for High-Speed Plasmonic Lithography Using Solid Immersion Lens With Sharp-Ridge Nanoaperture

2011 ◽  
Author(s):  
Hyunwoo Hwang ◽  
Won-Sup Lee ◽  
No-Cheol Park ◽  
Hyunseok Yang ◽  
Young-Pil Park ◽  
...  
Keyword(s):  
Surface Plasmon Resonance ◽  
Surface Plasmon ◽  
High Throughput ◽  
High Speed ◽  
Low Cost ◽  
Near Field ◽  
Nanometer Scale ◽  
Field Region ◽  
High Speeds ◽  
Gap Control

Recently, plasmonic nanolithography is studied by many researchers (1, 2 and 3). This presented a low-cost and high-throughput approach to maskless nanolithography technique that uses a metallic sharp-ridge nanoaperture with a high strong nanometer-sized optical spot induced by surface plasmon resonance. However, these nanometer-scale spots generated by metallic nanoapertures are formed in only the near-field region, which makes it very difficult to pattern above the photoresist surface at high-speeds.

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