Effects of Magnetized Thermal Plasma on The Propagation Properties of THz Waves

Author(s):  
Weizhong Yan ◽  
Xudong Bai ◽  
Fanwei Kong ◽  
Yuntao Sun ◽  
Pengcheng Hu ◽  
...  
AIP Advances ◽  
2017 ◽  
Vol 7 (12) ◽  
pp. 125325 ◽  
Author(s):  
Yunxian Tian ◽  
Weizhong Yan ◽  
Xiaoliang Gu ◽  
Xiaolin Jin ◽  
Jianqing Li ◽  
...  

Sensors ◽  
2021 ◽  
Vol 21 (1) ◽  
pp. 263
Author(s):  
Qingwen Rao ◽  
Guanjun Xu ◽  
Pengfei Wang ◽  
Zhengqi Zheng

The propagation characteristics of terahertz (THz) waves incident vertically into inhomogeneous and collisional dusty plasma with a ceramic substrate are studied using the scattering matrix method (SMM). The effects of the incident wave frequency and plasma parameters, such as the maximal electron density, dust particle density, dust particle radius and collision frequency, on the reflectance and transmittance of THz waves in the dusty plasma are discussed. In addition, the differences of the propagation properties in the dusty plasma, with and without ceramic substrate, are analyzed. Meanwhile, the differences of the propagation properties in dusty plasma and common plasma, respectively, with ceramic substrate are also compared. Simulation results show that the substrate and dust particles have significant influence on the propagation characteristics of THz wave in plasma sheath. Finally, the transmission increases with the increase of electron density, dust density, dust particle radius and collision frequency.


1990 ◽  
Vol 51 (C5) ◽  
pp. C5-281-C5-288
Author(s):  
P. Lj. STEFANOVIj ◽  
P. B. PAVLOVIj ◽  
M. M. JANKOVIj ◽  
S. N. OKA
Keyword(s):  

2003 ◽  
Vol 762 ◽  
Author(s):  
C. Smit ◽  
D.L. Williamson ◽  
M.C.M. van de Sanden ◽  
R.A.C.M.M. van Swaaij

AbstractExpanding thermal plasma CVD (ETP CVD) has been used to deposit thin microcrystalline silicon films. In this study we varied the position at which the silane is injected in the expanding hydrogen plasma: relatively far from the substrate and close to the plasma source, giving a long interaction time of the plasma with the silane, and close to the substrate, resulting in a short interaction time. The material structure is studied extensively. The crystalline fractions as obtained from Raman spectroscopy as well as from X-ray diffraction (XRD) vary from 0 to 67%. The average particle sizes vary from 6 to 17 nm as estimated from the (111) XRD peak using the Scherrer formula. Small angle X-ray scattering (SAXS) and flotation density measurements indicate void volume fractions of about 4 to 6%. When the samples are tilted the SAXS signal is lower than for the untilted case, indicating elongated objects parallel to the growth direction in the films. We show that the material properties are influenced by the position of silane injection in the reactor, indicating a change in the plasma chemistry.


Author(s):  
Milan Hrabovsky ◽  
M. Hlina ◽  
M. Konrad ◽  
Vladimir Kopecky ◽  
T. Kavka ◽  
...  

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