Deposition of c-oriented borocarbide thin films by laser ablation technique

1999 ◽  
Vol 9 (2) ◽  
pp. 1727-1730 ◽  
Author(s):  
M.R. Cimberle ◽  
C. Ferdeghini ◽  
G. Grassano ◽  
D. Marre ◽  
I. Pallecchi ◽  
...  
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Ablation Technique ◽  
Laser Ablation Technique

Lead Zirconate-Titanate Thin Films Prepared by the Laser Ablation Technique

1990 ◽  
Vol 200 ◽  
Author(s):  
C. K. Chiang ◽  
L. P. Cook ◽  
P. K. Schenck ◽  
P. S. Brody ◽  
J. M. Benedetto
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Lead Zirconate Titanate ◽  
Lead Zirconate ◽  
X Ray ◽  
Ablation Technique ◽  
Zirconate Titanate ◽  
Deposited Films ◽  
Plate Type ◽  
Laser Ablation Technique

ABSTRACTLead zirconate-titanate (PZT) thin films were prepared by the laser ablation technique. The PZT (Zr/Ti=53/47) target was irradiated using a focused q-switched Nd:YAG laser (15 ns, 100 mJ at 1.064 μ;m). The as-deposited films were amorphous as indicated by X-ray powder patterns, but crystallized readily with brief annealing above 650°C. The dielectric constant and the resistivity of the crystallized films were studied using a parallel-plate type capacitor structure.

Photoluminescent thin films of terbium chloride-doped yttrium oxide deposited by the pulsed laser ablation technique

1997 ◽  
Vol 303 (1-2) ◽  
pp. 76-83 ◽  
Author(s):  
J.C. Alonso ◽  
E. Haro-Poniatowski ◽  
R. Diamant ◽  
M. Fernández-Guasti ◽  
M. García
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Yttrium Oxide ◽  
Pulsed Laser ◽  
Pulsed Laser Ablation ◽  
Ablation Technique ◽  
Terbium Chloride ◽  
Laser Ablation Technique

Si1−xGex thin films deposited by the pulsed excimer laser ablation technique

1995 ◽  
Vol 86 (1-4) ◽  
pp. 175-179 ◽  
Author(s):  
F. Antoni ◽  
E. Fogarassy ◽  
C. Fuchs ◽  
B. Prévot ◽  
J.P. Stoquert
Keyword(s):  
Thin Films ◽  
Laser Ablation ◽  
Excimer Laser ◽  
Excimer Laser Ablation ◽  
Ablation Technique ◽  
Laser Ablation Technique
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