Inhibited dark-line defect formation in strained InGaAs/AlGaAs quantum well lasers

1990 ◽  
Vol 2 (8) ◽  
pp. 531-533 ◽  
Author(s):  
R.G. Waters ◽  
D.P. Bour ◽  
S.L. Yellen ◽  
N.F. Ruggieri
1996 ◽  
Vol 35 (Part 1, No. 11) ◽  
pp. 5637-5641 ◽  
Author(s):  
Yoshiaki Hasegawa ◽  
Takashi Egawa ◽  
Takashi Jimbo ◽  
Masayoshi Umeno

1981 ◽  
Vol 128 (3) ◽  
pp. 661-669 ◽  
Author(s):  
A. K. Chin ◽  
W. C. King ◽  
T. J. Leonard ◽  
R. J. Roedel ◽  
C. L. Zipfel ◽  
...  

1995 ◽  
Vol 34 (Part 1, No. 6A) ◽  
pp. 2994-2999 ◽  
Author(s):  
Yoshiaki Hasegawa ◽  
TakashiEgawa ◽  
Takashi Jimbo ◽  
MasayoshiUmeno

1992 ◽  
Vol 281 ◽  
Author(s):  
Takashi Egawa ◽  
Yoshiaki Hasegawa ◽  
Takashi Jimbo ◽  
Masayoshi Umeno

ABSTRACTConventional GaAs-based laser diodes grown on Si substrates suffer from rapid degradation, which results from the deteriorations of optical and electrical characteristics. Electroluminescence observation shows that the optical deterioration is caused by the formation of dark-line defects. The current-voltage (I-V) characteristic of the p-n junction is degraded with aging, and results in an ohmic-like under a higher ambient temperature and a larger forward current. The deterioration of the I-V characteristic is caused by defect-accelerated impurity diffusion because the growth of GaAs on Si substrates (GaAs/Si) involves the high dislocation density, the large tensile stress and the large amount of Si near the GaAs/Si interface. A significant improvement in reliability has been achieved in the strain-relieved AlGaAs/InGaAs laser diode on Si grown with the InGaAs intermediate layer. The stress relief by the InGaAs active layer and the reduction of the dark-line defect formation by the InGaAs intermediate layer are required to fabricate reliable GaAs-based laser diodes on Si substrates.


1988 ◽  
Vol 52 (16) ◽  
pp. 1347-1348 ◽  
Author(s):  
R. G. Waters ◽  
R. K. Bertaska

2009 ◽  
Vol 1195 ◽  
Author(s):  
Yongkun Sin ◽  
Nathan Presser ◽  
Neil Ives ◽  
Steven C. Moss

AbstractDegradation processes in high power broad-area InGaAs-AlGaAs strained quantum well lasers were studied using electron beam-induced current (EBIC) techniques, time-resolved electroluminescence (TR-EL) techniques, and deep-level transient spectroscopy (DLTS). Accelerated lifetests of the broad-area lasers yielded catastrophic failures at the front facet and also in the bulk. EBIC was employed to study dark line defects generated in degraded lasers stressed under different test conditions. TR-EL was employed to study the intra-cavity intensity distribution in real time as devices were aged. DLTS was employed to study deep electron traps in both pristine and degraded laser diodes. Lastly, we present a possible scenario for the initiation of bulk degradation in the broad-area lasers.


1982 ◽  
Vol 40 (11) ◽  
pp. 921-923 ◽  
Author(s):  
K. Endo ◽  
S. Matsumoto ◽  
H. Kawano ◽  
I. Sakuma ◽  
T. Kamejima

1992 ◽  
Vol 2 (9) ◽  
pp. 1727-1738 ◽  
Author(s):  
A. Accard ◽  
F. Brillouet ◽  
E. Duda ◽  
B. Fernier ◽  
G. Gelly ◽  
...  

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