Multiple-quantum-well GaInAs/GaInAsP tapered broad-area amplifiers with monolithically integrated waveguide lens for high-power applications

1993 ◽  
Vol 5 (8) ◽  
pp. 916-919 ◽  
Author(s):  
F. Koyama ◽  
K.-Y. Liou ◽  
A.G. Dentai ◽  
T. Tanbun-ek ◽  
C.A. Burrus
1996 ◽  
Author(s):  
Tsutomu Munakata ◽  
Yasumasa Kashima ◽  
Shigehiro Kusumoto ◽  
Akio Matoba ◽  
Hiroshi Takano

1996 ◽  
Vol 35 (Part 2, No. 4B) ◽  
pp. L493-L495 ◽  
Author(s):  
Toru Takayama ◽  
Osamu Imafuji ◽  
Tadaro Hashimoto ◽  
Masaaki Yuri ◽  
Akio Yoshikawa ◽  
...  

1993 ◽  
Author(s):  
Nils W. Carlson ◽  
So K. Liew ◽  
Raymond J. Menna ◽  
Peter D. Gardner ◽  
James T. Andrews ◽  
...  

1992 ◽  
Vol 72 (9) ◽  
pp. 4447-4448 ◽  
Author(s):  
K. Mobarhan ◽  
M. Razeghi ◽  
G. Marquebielle ◽  
E. Vassilaki

1996 ◽  
Vol 450 ◽  
Author(s):  
Yi Luo ◽  
Ai-Qing Jiang ◽  
Zhi-Biao Hao ◽  
Jian-Hua Wang ◽  
Terry W. K. Lai ◽  
...  

ABSTRACTWe will present results for an Al0.24Ga0.76As/GaAs diffused multiple quantum well with five periods of 100/100 Å thick well/barrier layers grown in between Al0.24Ga0.76As guiding layers and cladded on top by a 1 μm thick p-Al0.44Ga0.56As layer and on the bottom by an n-Al0.44Ga0.56As layer of equal thickness, on a n+-GaAs buffer layer and n+-GaAs substrate. Vacancy enhanced QW diffusion is employed where a 2000 Å thick layer of SiO2 is deposited on top of the diffused multiple quantum well structure. Photoluminescence measurement and photovoltage measurement at room temperature show that after rapid thermal annealing for 30 sec at 1000 °C to 1040 °C, a bandgap shift of 30 nm is obtained for the exciton edge. Further, this technique is applied to a ridge waveguide laser structure to make two windows for high power output up to 36 mW. This device shows that the diffusion process may have practical applications.


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