Wafer thermal desorption spectrometry in a rapid thermal processor using atmospheric pressure ionization mass spectrometry

2000 ◽  
Vol 13 (3) ◽  
pp. 315-321 ◽  
Author(s):  
G. Vereecke ◽  
E. Kondoh ◽  
P. Richardson ◽  
K. Maex ◽  
M.M. Heyns
1999 ◽  
Vol 103 (41) ◽  
pp. 8231-8238 ◽  
Author(s):  
Tracy E. Caldwell ◽  
K. L. Foster ◽  
Thorsten Benter ◽  
Sarka Langer ◽  
John C. Hemminger ◽  
...  

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