Tunable, high-power, subpicosecond blue-green dye laser system with a two-stage dye amplifier

1991 ◽  
Vol 27 (5) ◽  
pp. 1221-1227 ◽  
Author(s):  
T.E. Sharp ◽  
C.B. Dane ◽  
D. Barber ◽  
F.K. Tittel ◽  
P.J. Wisoff ◽  
...  
Keyword(s):  
High Power ◽  
Laser System ◽  
Dye Laser ◽  
Two Stage

Broadband, high gain two-stage optical parametric chirped pulse amplifier using BBO crystals for a femtosecond high-power Ti:sapphire laser system

2012 ◽  
Vol 12 (3) ◽  
pp. 648-653 ◽  
Author(s):  
Jin Woo Yoon ◽  
Seong Ku Lee ◽  
Tae Jun Yu ◽  
Jae Hee Sung ◽  
Tae Moon Jeong ◽  
...  
Keyword(s):  
High Power ◽  
Laser System ◽  
High Gain ◽  
Two Stage ◽  
Chirped Pulse ◽  
Ti:Sapphire Laser ◽  
Optical Parametric ◽  
Pulse Amplifier

Design and performance of a high-power, synchronized Nd:YAG–dye laser system

1989 ◽  
Vol 14 (1) ◽  
pp. 42 ◽  
Author(s):  
M. D. Perry ◽  
J. Weston ◽  
R. Ettlebrick ◽  
O. L. Landen
Keyword(s):  
High Power ◽  
Laser System ◽  
Dye Laser ◽  
And Performance

High-power femtosecond dye-laser system

1988 ◽  
Vol 5 (8) ◽  
pp. 1573 ◽  
Author(s):  
M. M. Murnane ◽  
R. W. Falcone
Keyword(s):  
High Power ◽  
Laser System ◽  
Dye Laser

HIGH-POWER NARROW-BAND TUNEABLE IMPACT PERIODIC DYE LASER

2010 ◽  
Vol 69 (14) ◽  
pp. 1301-1309
Author(s):  
V. P. Pelipenko ◽  
P.G. Dalchenko ◽  
M. I. Dzyubenko
Keyword(s):  
High Power ◽  
Narrow Band ◽  
Dye Laser

MULTISTAGE MICROSTRIP UHF LOAD

2018 ◽  
pp. 53-57 ◽  
Author(s):  
G. G. Savenkov ◽  
V. P. Razinkin ◽  
A. D. Mekhtiev
Keyword(s):  
Frequency Response ◽  
Frequency Band ◽  
High Power ◽  
Two Stage ◽  
High Power Microwave ◽  
Modelling Method ◽  
Optimal Values ◽  
Inductive Elements ◽  
Power Microwave

Applications of modern terminal loads and its relevant disadvantages are described in this paper. The decomposing method of wideband microwave high power microstrip loads design is proposed in this paper with purpose of matching quality improving. Multiple extension of multistage load bandwidth is provided by using of external matching circuit and internal matching inductive elements. The maximum reachable bandwidth of multistage load is estimated and optimal values of mathing circuit elements are founded on basis of equivalent lumped scheme. The topology of microstrip two-stage high power microwave load is developed and its frequency response, calculated via numeric electrodynamic modelling method is outlined in the paper. Modelling results show good matching quality of considered load at the frequency band below 3,5 GHz.

Compact high power Raman laser system using phase-modulated sidebands amplified by a single tapered amplifier

CPEM 2010 ◽  
2010 ◽  
Author(s):  
K. S. Lee ◽  
S. E. Park ◽  
T. Y. Kwon ◽  
S. B. Lee ◽  
J. Kim
Keyword(s):  
High Power ◽  
Laser System ◽  
Raman Laser

Evidence for diffusion independent triplet quenching in the rhodamine 6G ethylene glycol cw dye laser system

1973 ◽  
Vol 7 (3) ◽  
pp. 176-177 ◽  
Author(s):  
C.V. Shank ◽  
J. Edighoffer ◽  
A. Dienes ◽  
E.P. Ippen
Keyword(s):  
Ethylene Glycol ◽  
Rhodamine 6G ◽  
Laser System ◽  
Dye Laser

ALD anti-reflection coatings at 1ω, 2ω, 3ω, and 4ω for high-power ns-laser application

2018 ◽  
Vol 7 (1-2) ◽  
pp. 23-31 ◽  
Author(s):  
Hao Liu ◽  
Lars Jensen ◽  
Ping Ma ◽  
Detlev Ristau
Keyword(s):  
High Power ◽  
High Surface ◽  
Laser System ◽  
Damage Threshold ◽  
Atomic Layer ◽  
Intensity Difference ◽  
High Power Laser ◽  
Power Laser ◽  
Laser Applications ◽  
Laser Induced Damage

AbstractAtomic layer deposition (ALD) facilitates the deposition of coatings with precise thickness, high surface conformity, structural uniformity, and nodular-free structure, which are properties desired in high-power laser coatings. ALD was studied to produce uniform and stable Al2O3and HfO2single layers and was employed to produce anti-reflection coatings for the harmonics (1ω, 2ω, 3ω, and 4ω) of the Nd:YAG laser. In order to qualify the ALD films for high-power laser applications, the band gap energy, absorption, and element content of single layers were characterized. The damage tests of anti-reflection coatings were carried out with a laser system operated at 1ω, 2ω, 3ω, and 4ω, respectively. The damage mechanism was discussed by analyzing the damage morphology and electric field intensity difference. ALD coatings exhibit stable growth rates, low absorption, and rather high laser-induced damage threshold (LIDT). The LIDT is limited by HfO2as the employed high-index material. These properties indicate the high versatility of ALD films for applications in high-power coatings.

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