scholarly journals Effect of a strong axial magnetic field in the plasma recombination and extreme ultraviolet emission from a highly-ionized capillary discharge

1990 ◽  
Vol 26 (10) ◽  
pp. 1809-1814 ◽  
Author(s):  
M.C. Marconi ◽  
J.J. Rocca ◽  
J.F. Schmerge ◽  
M. Villagram ◽  
F.J. Lehmann
Keyword(s):  
Magnetic Field ◽  
Extreme Ultraviolet ◽  
Axial Magnetic Field ◽  
Capillary Discharge ◽  
Ultraviolet Emission

Effects of an axial magnetic field on Z-pinch plasmas for extreme ultraviolet sources

2006 ◽  
Vol 99 (1) ◽  
pp. 013305 ◽  
Author(s):  
Sunao Katsuki ◽  
Akihiro Kimura ◽  
Yoshihiro Kondo ◽  
Hiroyuki Horita ◽  
Takao Namihira ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Extreme Ultraviolet ◽  
Axial Magnetic Field ◽  
Z Pinch

scholarly journals The effects of using axial magnetic field in extreme ultraviolet photon sources for nanolithography – recent integrated simulation

2016 ◽  
Vol 34 (1) ◽  
pp. 163-170 ◽  
Author(s):  
V. Sizyuk ◽  
A. Hassanein
Keyword(s):  
Magnetic Field ◽  
Angular Distribution ◽  
Magnetic Fields ◽  
Extreme Ultraviolet ◽  
Axial Magnetic Field ◽  
Effective Control ◽  
Laser Irradiance ◽  
Laser Target ◽  
Integrated Simulation ◽  
Magnetic Field Gradients

AbstractWe developed a comprehensive model for simulating laser/target interaction in the presence of external axial magnetic fields. The model was integrated into the framework of the HEIGHTS-LPP computer simulation package and benchmarked with recent experimental results. The package was then used to study the angular distribution of extreme ultraviolet (EUV) photon output in plasmas produced in tin planar targets by a Nd:YAG laser. A moderate (0.5 T) permanent magnetic field does not affect EUV source evolution and output. More effective control of plasma plume expansion should be based on magnetic field gradients, that is, on the temporary varying magnetic fields as a magnetic pinch. Analysis of angular EUV output showed strong anisotropy of photon emissions. We found that the correct monitoring angle (i.e., at which the measured EUV flux corresponds to the averaged value after the correctly integrated angular distribution) does not depend on laser irradiance in the studied range and is equivalent to ~60°. We recommend arranging the EUV sensors accordingly in experiments with planar tin targets.

Extreme ultraviolet emission and confinement of tin plasmas in the presence of a magnetic field

2014 ◽  
Vol 21 (5) ◽  
pp. 053106 ◽  
Author(s):  
Amitava Roy ◽  
Syed Murtaza Hassan ◽  
Sivanandan S. Harilal ◽  
Akira Endo ◽  
Tomas Mocek ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Extreme Ultraviolet ◽  
Ultraviolet Emission ◽  
Tin Plasmas

EXPANSION OF LASER-PRODUCED ION BEAMS IN AN AXIAL MAGNETIC FIELD

2002 ◽  
Vol 6 (4) ◽  
pp. 8
Author(s):  
J. Wolowski ◽  
J. Badziak ◽  
P. Parys ◽  
E. Woryna ◽  
J. Krasa ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Axial Magnetic Field ◽  
Ion Beams
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