Explosion model applied to an intense pulsed plasma source for thin film deposition

1997 ◽  
Vol 25 (1) ◽  
pp. 89-96 ◽  
Author(s):  
P.D. Pedrow ◽  
K.O. Goyal ◽  
R. Mabalingham ◽  
M.A. Osman
Keyword(s):  
Thin Film ◽  
Plasma Source ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Pulsed Plasma

A novel industrial thin film deposition technology for sustainable CdTe photovoltaics

2012 ◽  
Vol 1447 ◽  
Author(s):  
P. Nozar ◽  
G. Mittica ◽  
S. Milita ◽  
C. Albonetti ◽  
F. Corticelli ◽  
...  
Keyword(s):  
Thin Film ◽  
Plasma Deposition ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Cubic Phase ◽  
Pulsed Plasma ◽  
Grid Parity ◽  
Type Semiconductor ◽  
Pulsed Plasma Deposition ◽  
Quartz Substrates

ABSTRACTCdTe and CdS are emerging as the most promising materials for thin film photovoltaics in the quest of the achievement of grid parity. The major challenge for the advancement of grid parity is the achievement of high quality at the same time as low fabrication cost. The present paper reports the results of the new deposition technique, Pulsed Plasma Deposition (PPD), for the growth of the CdTe layers on CdS/ZnO/quartz and quartz substrates. The PPD method allows to deposit at low temperature. The optical band gap of deposited layers is 1.50 eV, in perfect accord with the value reported in the literature for the crystalline cubic phase of the CdTe.The films are highly crystalline with a predominant cubic phase, a random orientation of the grains of the film and have an extremely low surface roughness of 4.6±0.7 nm r.m.s.. The low roughness, compared to traditional thermal deposition methods (close space sublimation and vapour transport) permits the reduction of the active absorber and n-type semiconductor layers resulting in a dramatic reduction of material usage and the relative deposition issues like safety, deposition rate and ultimately cost

scholarly journals Characteristics of a Pulsed Plasma Process and YBaCuO Thin Film Deposition

1991 ◽  
Vol 111 (8) ◽  
pp. 702-710
Author(s):  
Kenji Ebihara ◽  
Toshiyuki Matsumoto ◽  
Tomoaki Ikegami ◽  
Yasunori Shiraishi ◽  
Sadao Maeda
Keyword(s):  
Thin Film ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Pulsed Plasma ◽  
Plasma Process

Thin film deposition using a plasma source with a hot refractory anode vacuum arc

2010 ◽  
Vol 45 (23) ◽  
pp. 6325-6331 ◽  
Author(s):  
Isak I. Beilis ◽  
Yosef Koulik ◽  
Raymond L. Boxman ◽  
David Arbilly
Keyword(s):  
Thin Film ◽  
Plasma Source ◽  
Thin Film Deposition ◽  
Film Deposition ◽  
Vacuum Arc
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