Vacuum arc ion sources for particle accelerators and ion implantation

1993 ◽  
Vol 21 (5) ◽  
pp. 537-546 ◽  
Author(s):  
I.G. Brown
1994 ◽  
Vol 65 (10) ◽  
pp. 3061-3081 ◽  
Author(s):  
Ian G. Brown
Keyword(s):  

Author(s):  
A. S. Bugaev ◽  
V. I. Gushenets ◽  
A. G. Nikolaev ◽  
E. M. Oks ◽  
K. P. Savkin ◽  
...  
Keyword(s):  

2007 ◽  
Vol 14 (03) ◽  
pp. 517-520
Author(s):  
M. F. CHENG ◽  
J. H. YANG ◽  
X. D. LUO ◽  
T. H. ZHANG

Mo and C ions extracted from a metal vapor vacuum arc ion source were implanted into the surface of die steel (H13) to compare the wear resistance mechanisms of the implanted samples, respectively. The concentration depth profiles of implanted ions were measured using Rutherford backscattering spectroscopy and calculated by a code called TRIDYN. The structures of the implanted steel were observed by X-ray photoelectron spectroscopy and grazing-angle X-ray diffraction, respectively. It was found that the conventional heat-treated H13 steel could not be further hardened by the subsequent implanted C ions, and the thickness of the implanted layer was not an important factor for the Mo and C ion implantation to improve the wear resistance of the H13 steel. Mo ion implantation could obviously improve the wear resistance of the steel at an extraction voltage of 48 kV and a dose of 5 × 1017 cm -2 due to formation of a modification layer of little oxidation with Mo 2 C in the implanted surface.


2014 ◽  
Vol 27 ◽  
pp. 1460147 ◽  
Author(s):  
BIBHUDUTTA ROUT ◽  
MANGAL S. DHOUBHADEL ◽  
PRAKASH R. POUDEL ◽  
VENKATA C. KUMMARI ◽  
WICKRAMAARACHCHIGE J. LAKSHANTHA ◽  
...  

The University of North Texas (UNT) Ion Beam Modification and Analysis Laboratory (IBMAL) has four particle accelerators including a National Electrostatics Corporation (NEC) 9SDH-2 3 MV tandem Pelletron, a NEC 9SH 3 MV single-ended Pelletron, and a 200 kV Cockcroft-Walton. A fourth HVEC AK 2.5 MV Van de Graaff accelerator is presently being refurbished as an educational training facility. These accelerators can produce and accelerate almost any ion in the periodic table at energies from a few keV to tens of MeV. They are used to modify materials by ion implantation and to analyze materials by numerous atomic and nuclear physics techniques. The NEC 9SH accelerator was recently installed in the IBMAL and subsequently upgraded with the addition of a capacitive-liner and terminal potential stabilization system to reduce ion energy spread and therefore improve spatial resolution of the probing ion beam to hundreds of nanometers. Research involves materials modification and synthesis by ion implantation for photonic, electronic, and magnetic applications, micro-fabrication by high energy (MeV) ion beam lithography, microanalysis of biomedical and semiconductor materials, development of highenergy ion nanoprobe focusing systems, and educational and outreach activities. An overview of the IBMAL facilities and some of the current research projects are discussed.


Sign in / Sign up

Export Citation Format

Share Document