Stable gallium arsenide MIS capacitors and MIS field effect transistors by (NH/sub 4/)/sub 2/S/sub x/ treatment and hydrogenation using plasma deposited silicon nitride gate insulator

2002 ◽  
Vol 49 (3) ◽  
pp. 343-353 ◽  
Author(s):  
K. Remashan ◽  
K.N. Bhat
1985 ◽  
Vol 32 (1) ◽  
pp. 61-66 ◽  
Author(s):  
A.J. Holden ◽  
D.R. Daniel ◽  
I. Davies ◽  
C.H. Oxley ◽  
H.D. Rees

Nano Letters ◽  
2018 ◽  
Vol 18 (7) ◽  
pp. 4431-4439 ◽  
Author(s):  
J. G. Gluschke ◽  
J. Seidl ◽  
R. W. Lyttleton ◽  
D. J. Carrad ◽  
J. W. Cochrane ◽  
...  

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