Stable gallium arsenide MIS capacitors and MIS field effect transistors by (NH/sub 4/)/sub 2/S/sub x/ treatment and hydrogenation using plasma deposited silicon nitride gate insulator
2002 ◽
Vol 49
(3)
◽
pp. 343-353
◽
Keyword(s):
2012 ◽
Vol E95.C
(5)
◽
pp. 885-890
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1985 ◽
Vol 32
(1)
◽
pp. 61-66
◽
Keyword(s):
Keyword(s):
1969 ◽
Vol 12
(2)
◽
pp. 111-116
◽
1980 ◽
Vol 23
(2)
◽
pp. 157-172
◽
2008 ◽
Vol 21
(2)
◽
pp. 189-192
◽
Keyword(s):