Error analysis leading to design criteria for transmission line model characterization of ohmic contacts

2001 ◽  
Vol 48 (4) ◽  
pp. 758-766 ◽  
Author(s):  
Haw-Jye Ueng ◽  
D.B. Janes ◽  
K.J. Webb
2002 ◽  
Vol 85 (3) ◽  
pp. 16-22
Author(s):  
Kiichi Kamimura ◽  
Shinsuke Okada ◽  
Masato Nakao ◽  
Yoshiharu Onuma ◽  
Shozo Yamashita

1995 ◽  
Vol 382 ◽  
Author(s):  
Geoffrey K. Reeves ◽  
Patrick W. Leech ◽  
H. Barry Harrison

ABSTRACTThe standard Transmission Line Model (TLM) is an electrical network that is commonly used to model planar two-layer (metal-semiconductor) ohmic contacts. More complex multilayered planar structures have led to the development of more complex models. A Tri-Layer Transmission Line Model (TLTLM) was recently proposed in order to more accurately represent an alloyed ohmic contact. The TLTLM also enables other layered planar contact structures such as non-alloyed n+/n, heterojunction and metal-silicide-silicon contacts to be analysed. In this paper, it is shown that when the TLTLM is combined with a modified TLM network, important device properties such as contact and parasitic resistance can be derived for device structures using several epilayers such as FET's. An example is given of the current distribution in an FET and the calculation of the parasitic resistance in the gate-drain channel and the contact resistance of the drain.


Sign in / Sign up

Export Citation Format

Share Document