Low-resistivity poly-metal gate electrode durable for high-temperature processing

1996 ◽  
Vol 43 (11) ◽  
pp. 1864-1869 ◽  
Author(s):  
Y. Akasaka ◽  
S. Suehiro ◽  
K. Nakajima ◽  
T. Nakasugi ◽  
K. Miyano ◽  
...  
Keyword(s):  
High Temperature ◽  
Gate Electrode ◽  
Metal Gate ◽  
Low Resistivity ◽  
High Temperature Processing

AFM study of the dynamics of α-alumina surface faceting during high-temperature processing

1995 ◽  
Vol 53 ◽  
pp. 334-335 ◽  
Author(s):  
Michael W. Bench ◽  
Jason R. Heffelfinger ◽  
C. Barry Carter
Keyword(s):  
High Temperature ◽  
Thin Foil ◽  
Sem Analysis ◽  
Conductive Coatings ◽  
Force Microscopy ◽  
Minimal Sample ◽  
Atomic Force ◽  
Formation And Evolution ◽  
High Temperature Processing ◽  
Nominal Surface

To gain a better understanding of the surface faceting that occurs in α-alumina during high temperature processing, atomic force microscopy (AFM) studies have been performed to follow the formation and evolution of the facets. AFM was chosen because it allows for analysis of topographical details down to the atomic level with minimal sample preparation. This is in contrast to SEM analysis, which typically requires the application of conductive coatings that can alter the surface between subsequent heat treatments. Similar experiments have been performed in the TEM; however, due to thin foil and hole edge effects the results may not be representative of the behavior of bulk surfaces.The AFM studies were performed on a Digital Instruments Nanoscope III using microfabricated Si3N4 cantilevers. All images were recorded in air with a nominal applied force of 10-15 nN. The alumina samples were prepared from pre-polished single crystals with (0001), , and nominal surface orientations.

Applications of CoSi2 to VLSI and ULSI

1993 ◽  
Vol 320 ◽  
Author(s):  
S. P. Murarka
Keyword(s):  
Corrosion Resistance ◽  
High Temperature ◽  
Integrated Circuits ◽  
Lattice Mismatch ◽  
Electrical Contacts ◽  
High Conductivity ◽  
Low Resistivity ◽  
Polysilicon Films ◽  
Continued Use

ABSTRACTSilicides have found application as high conductivity, high temperature, and corrosion resistance materials that form good electrical contacts to silicon and good low resistivity cladding on polysilicon films used as gate metal. Of various silicides investigated in past CoSi2 offers several advantages including lowest resistivity, self-aligned formation, low lattice mismatch with silicon, stability in presence of dopants and on SiO2, Si3N4, or Sioxynitrides, and reliability to process temperatures ≤900°C even when used in thicknesses as thin as 50-60 nm. Thus, CoSi2 has found an application in VLSI and ULSI. In this paper, the properties, formation and processing, reliability, and applicability of CoSi2 will be reviewed. It will be shown that CoSi2 is only silicide that offers properties and reliability for continued use in sub-0.25 pm VLSI and ULSI integrated circuits.

Influence of Enzyme Activity of Bacteria and Leucocytes in Raw Milk on Age Gelation after UHT Processing

1984 ◽  
Vol 47 (2) ◽  
pp. 105-107 ◽  
Author(s):  
BARBARA P. KEOGH ◽  
G. PETTINGILL
Keyword(s):  
Enzyme Activity ◽  
High Temperature ◽  
Inhibitory Action ◽  
Raw Milk ◽  
Bacterial Counts ◽  
High Temperature Processing ◽  
The Relationship ◽  
Ultra High Temperature

An investigation was undertaken into the relationship between the enzyme activity of cells harvested from raw milk and time taken for age gelation (TAG) to occur in the milk after ultra-high-temperature processing. It was shown that there was no relationship between the TAG and the bacterial counts on milk agar at 30°C or 7°C nor was there a relationship between the counts and the level of enzyme activity of the harvested cells. There was, however, a significant correlation between the level of enzyme activity of the harvested cells and the TAG. When extra bovine leucocytes were added to raw milk before processing, the TAG was increased. This suggested that there was an inhibitory action of leucocytes in development of age gelation.

Optimization of low resistivity molybdenum thin F ilms for high-temperature microheater applications

2021 ◽  
pp. 106971
Author(s):  
Lakshmi Rajeswara Rao Langoju ◽  
Monoj Kumar Singha ◽  
Kiruba Mangalam Subramaniam ◽  
Sundarrajan Asokan
Keyword(s):  
High Temperature ◽  
Low Resistivity

Boron Transport Through Surface Channel pMOS Using W-poly Metal Gate Electrode

2002 ◽  
Vol 149 (8) ◽  
pp. G441 ◽  
Author(s):  
Sang-Wook Park ◽  
Dong-Jin Kim ◽  
Chan-Ho Lee ◽  
Seung-Cheol Lee ◽  
Noh-Yeal Kwak ◽  
...  
Keyword(s):  
Gate Electrode ◽  
Metal Gate

Interpretation of macropore shape transformation in crystalline silicon upon high temperature processing

2010 ◽  
Vol 108 (7) ◽  
pp. 074902 ◽  
Author(s):  
Moustafa Y. Ghannam ◽  
Abdulazeez S. Alomar ◽  
Jef Poortmans ◽  
Robert P. Mertens
Keyword(s):  
High Temperature ◽  
Crystalline Silicon ◽  
Shape Transformation ◽  
High Temperature Processing

Effect of high-pressure/high-temperature processing on chemical pectin conversions in relation to fruit and vegetable texture

2009 ◽  
Vol 115 (1) ◽  
pp. 207-213 ◽  
Author(s):  
Ans De Roeck ◽  
Thomas Duvetter ◽  
Ilse Fraeye ◽  
Iesel Van der Plancken ◽  
Daniel Ndaka Sila ◽  
...  
Keyword(s):  
High Pressure ◽  
High Temperature ◽  
Fruit And Vegetable ◽  
High Pressure High Temperature ◽  
High Temperature Processing

scholarly journals Changes in Ginsenoside Compositions by High Temperature Processing under Various Soaking Conditions

2017 ◽  
Vol 23 (5) ◽  
pp. 689-696
Author(s):  
Gwi Yeong Jang ◽  
Yoon Jeong Lee ◽  
Meishan Li ◽  
Min Young Kim ◽  
Sang Hoon Lee ◽  
...  
Keyword(s):  
High Temperature ◽  
High Temperature Processing
Sign in / Sign up

Export Citation Format

Share Document